基本信息:
- 专利标题： 중합체 및 포지티브형 레지스트 조성물
- 专利标题（英）：Polymer and a positive resist composition
- 专利标题（中）：聚合物和正光刻胶组合物
- 申请号：KR1020177022343 申请日：2016-02-15
- 公开(公告)号：KR1020170120591A 公开(公告)日：2017-10-31
- 发明人： 호시노,마나부
- 申请人： 니폰 제온 가부시키가이샤
- 申请人地址： *-*, Marunouchi *-chome, Chiyoda-ku, Tokyo, JAPAN
- 专利权人： 니폰 제온 가부시키가이샤
- 当前专利权人： 니폰 제온 가부시키가이샤
- 当前专利权人地址： *-*, Marunouchi *-chome, Chiyoda-ku, Tokyo, JAPAN
- 代理人： 특허법인우인
- 优先权： JPJP-P-2015-031730 2015-02-20
- 国际申请： PCT/JP2016/000770 2016-02-15
- 国际公布： WO2016132725 2016-08-25
- 主分类号： G03F7/039
- IPC分类号： G03F7/039 ; C08F220/22 ; C08F212/06
The invention, a low sense film ratio in the low dose, and γ values, and polymers that sensitivity can be satisfactorily used as the high positive resist, and provides a positive resist composition capable of forming the efficient high resolution pattern of and that for the purpose. The polymers of the present invention, and α- methyl styrene unit, and a is less than 1.48 containing α- chloro methyl acrylate units, a molecular weight distribution (Mw / Mn), the molecular weight is more than 0.5% and the ratio of the components is less than 6000, and, the ratio of the component having a molecular weight of more than 80000 more than 6.0%. In addition, the positive resist composition of the present invention includes the above-mentioned polymer and a solvent.