基本信息:
- 专利标题: 결함 관찰 장치 및 결함 관찰 방법
- 专利标题(英):Defect observation device and defect observation method
- 专利标题(中):缺陷观察装置和缺陷观察方法
- 申请号:KR1020177015464 申请日:2014-12-10
- 公开(公告)号:KR1020170077244A 公开(公告)日:2017-07-05
- 发明人: 히라이다께히로 , 나까야마히데끼 , 니시가따겐이찌
- 申请人: 가부시키가이샤 히다치 하이테크놀로지즈
- 申请人地址: **-**, NISHISHINBASHI *-CHOME, MINATO-KU, TOKYO JAPAN
- 专利权人: 가부시키가이샤 히다치 하이테크놀로지즈
- 当前专利权人: 가부시키가이샤 히다치 하이테크놀로지즈
- 当前专利权人地址: **-**, NISHISHINBASHI *-CHOME, MINATO-KU, TOKYO JAPAN
- 代理人: 장수길; 이중희; 박상돈
- 国际申请: PCT/JP2014/082609 2014-12-10
- 国际公布: WO2016092640 2016-06-16
- 主分类号: G01N21/956
- IPC分类号: G01N21/956 ; G01N21/88 ; G01N21/89 ; G01N21/95 ; G06T7/00
When interpreting the low magnification defect image, the method for determining the application or wrong of the defect detection method according to the cell comparison, can not be applied to the defect detection method according to the cell comparison, increases the rate at which the transition to the fault detecting method based on die comparison , than to defects detected by the defect detection method according to the die comparison in the first place, it may occur that the throughput is lowered. The present invention in a stable throughput, and for the purpose of performing defect detection with high accuracy. The present invention uses the reference image, and determines the failure detection processing mode suitable for detecting a defect from the defect image, and detects a defect from the defect image is determined by the art fault detection processing mode.
公开/授权文献:
- KR101955268B1 결함 관찰 장치 및 결함 관찰 방법 公开/授权日:2019-03-08
信息查询:
EspacenetIPC结构图谱:
G | 物理 |
--G01 | 测量;测试 |
----G01N | 借助于测定材料的化学或物理性质来测试或分析材料 |
------G01N21/00 | 利用光学手段,即利用红外光、可见光或紫外光来测试或分析材料 |
--------G01N21/01 | .便于进行光学测试的装置或仪器 |
----------G01N21/88 | ..测试瑕疵、缺陷或污点的存在 |
------------G01N21/95 | ...特征在于待测物品的材料或形状 |
--------------G01N21/956 | ....检测物品表面上的图案 |