基本信息:
- 专利标题： 마이크로파 유도 플라즈마 세정 디바이스 및 발생로 가스를 위한 방법
- 专利标题（英）：Microwave induced plasma cleaning device and method for producer gas
- 专利标题（中）：微波诱导等离子体清洁装置及其制造方法
- 申请号：KR1020167033961 申请日：2014-10-17
- 公开(公告)号：KR1020170026349A 公开(公告)日：2017-03-08
- 发明人： 팟기터,디온,존 , 로프틴,마크,올리버 , 스탄지오니,톰 , 브라운,제프리,스캇
- 申请人： 피에이치지 에너지, 엘엘씨
- 申请人地址： **** Owen Drive, Suite ***, Nashville, TN *****, U.S.A.
- 专利权人： 피에이치지 에너지, 엘엘씨
- 当前专利权人： 피에이치지 에너지, 엘엘씨
- 当前专利权人地址： **** Owen Drive, Suite ***, Nashville, TN *****, U.S.A.
- 代理人： 특허법인아주김장리
- 优先权： US62/006,448 2014-06-02
- 国际申请： PCT/US2014/061228 2014-10-17
- 国际公布： WO2015187189 2015-12-10
- 主分类号： C10K3/00
- IPC分类号： C10K3/00 ; C10K1/02 ; C10K1/20 ; C10K1/00 ; C10K1/34 ; C10K1/32 ; C10K3/02 ; B01J19/24 ; B01J8/00 ; B01J8/04
Device and method for cleaning the gas generated to include a filter layer chamber, the microwave chamber, the first catalytic chamber and a second catalyst chamber. The filter layer chamber includes an inlet and outlet waste activated carbon for carbon-based material. It said microwave chamber includes a permeable top and the waveguide that can be introduced into a microwave by using the magnetron to the device around the edge portion. Wherein the first catalytic chamber is connected to the microwave chamber, the second catalytic chamber is connected to the first catalyst chamber. The method includes the step, the filter layer within a carbon-based material, said microwave chamber the chamber the gas to the microwaves by using the magnetron and the waveguide introduced into the microwave chamber for filling the filter layer chamber with a carbon-based material, wherein claim by passing a first catalyst chamber and the second catalytic chamber includes the use of the device by the step of separating the carbon of the entrapped in the gas.