基本信息:
- 专利标题： 나노튜브들을 증착시키기 위한 디바이스
- 专利标题（英）：Device for depositing nanotubes
- 专利标题（中）：用于沉积纳米颗粒的装置
- 申请号：KR1020167029330 申请日：2015-03-19
- 公开(公告)号：KR1020160135343A 公开(公告)日：2016-11-25
- 发明人： 조래이,알렉산드레 , 립핑턴,데이비드에릭 , 테오,케네스비.케이. , 루페싱헤,나린엘.
- 申请人： 아익스트론 에스이
- 申请人地址： Dornkaulstrasse *, ***** Herzogenrath Germany
- 专利权人： 아익스트론 에스이
- 当前专利权人： 아익스트론 에스이
- 当前专利权人地址： Dornkaulstrasse *, ***** Herzogenrath Germany
- 代理人： 특허법인 남앤드남
- 优先权： DE10 2014 104 0112 2014-03-24
- 国际申请： PCT/EP2015/055801 2015-03-19
- 国际公布： WO2015144558 2015-10-01
- 主分类号： C23C16/26
- IPC分类号： C23C16/26 ; C23C16/458 ; C23C16/455 ; C01B31/02 ; C01B31/04 ; C23C16/46
The present invention on the substrate (6) supported by a substrate support (1) disposed in the process chamber housing 19, the carbonaceous (carbonaceous) structures, e.g., nanotube or graphene form of a layer It relates to a device for depositing, wherein the process gas to the processing chamber housing 19, the gas inlet element, the gas discharge opening (39), at least one substrate (6) through (24, 25) disposed in the It may be fed in a direction. A functionally advantageous modification according to the invention, the process chamber housing 19 is the holding recesses (holding recesses) (34, 35, 36, 37, 38) to have two opposed walls, which (48, 48 ') have. At least one plate-shaped components (24, 25, 26, 30, 31) is arranged in the process chamber housing 19, the plate-shaped component is one wall of the two walls (48, 48 '), respectively of the holding recess with each other and elsewhere to be inserted individually in (34 to 38) has two edges.