基本信息:
- 专利标题： 가돌리늄제 스퍼터링 타깃 및 동 타깃의 제조 방법
- 专利标题（英）：Gadolinium sputtering target and method for manufacturing the target
- 专利标题（中）：GADOLINIUM溅射目标和制造目标的方法
- 申请号：KR1020167000071 申请日：2010-12-21
- 公开(公告)号：KR1020160008655A 公开(公告)日：2016-01-22
- 发明人： 츠카모토시로
- 申请人： 제이엑스금속주식회사
- 申请人地址： *-*, Otemachi *-chome, Chiyoda-ku, Tokyo, Japan
- 专利权人： 제이엑스금속주식회사
- 当前专利权人： 제이엑스금속주식회사
- 当前专利权人地址： *-*, Otemachi *-chome, Chiyoda-ku, Tokyo, Japan
- 代理人： 특허법인코리아나
- 优先权： JPJP-P-2009-292496 2009-12-24
- 国际申请： PCT/JP2010/072965 2010-12-21
- 国际公布： WO2011078148 2011-06-30
- 主分类号： C23C14/34
- IPC分类号： C23C14/34 ; B23K20/02
摘要：
가돌리늄타깃과티탄제백킹플레이트의조립체로서, 가돌리늄타깃과티탄제백킹플레이트의접합계면에, 고상확산접합계면을갖는것을특징으로하는가돌리늄타깃과티탄제백킹플레이트조립체. 가돌리늄제스퍼터링타깃에적합한백킹플레이트를알아냄과함께, 최적인접합조건을탐색하고, 성막속도를향상시킴과함께스퍼터링을안정시키고, 타깃재와백킹플레이트의접합강도를증가시켜타깃재와백킹플레이트의휨의발생이나박리를방지하여, 스퍼터링시의파티클의발생을억제하는것을과제로한다.
摘要（英）：
Gadolinium titanium target and a second assembly of the backing plate, gadolinium titanium target and joined at an interface, the solid phase diffusion bonding the titanium target and the gadolinium backing plate assembly, characterized in that it has an interface of the backing plate. With the clearance out the backing plate suitable for gadolinium second sputtering target, the search for optimal bonding conditions and to stabilize the sputtering with improving the deposition rate, the target material and to increase the bonding strength between the backing plate target material and a backing plate prevention of the occurrence of bending or peeling to be that of suppressing the generation of particles during sputtering to challenge.