The chemical vapor deposition apparatus for a flat-panel display is disclosed. The chemical vapor deposition apparatus for flat panel displays according to an embodiment of the present invention, after the reaction at the surface of the deposited material at the same time and supplies the deposition material to for a flat panel display substrate board to the exhaust gas and the resulting reaction product to the upper supply / cut-out; Doedoe placed on top of the gas supply / cut-out, the backing plate to form a buffer space between the gas supply / cut-out and; And the reaction product exhaust port through the backing plate in communication with the buffer space, and close to the lower end of the reaction the exhaust port and the reactant exhaust port so as to uniformly control the exhaust pressure applied to the reaction is introduced into the buffer space through the gas supply / cut-out It comprises a reactant exhaust unit having a plurality of exhaust baffle through hole formed in communication with the gas supply / cut-out is, a body portion; And doedoe provided on the lower body portion, and includes a plasma density increases to raise the plasma density between the substrate and the body portion.