基本信息:
- 专利标题: 기판 테이블의 위치를 측정하기 위한 메트롤로지 시스템을 갖는 리소그래피 장치
- 专利标题(英):Lithographic apparatus with a metrology system for measuring a position of a substrate table
- 专利标题(中):具有用于测量基板的位置的计量系统的平面设备
- 申请号:KR1020147024049 申请日:2013-01-25
- 公开(公告)号:KR1020140140541A 公开(公告)日:2014-12-09
- 发明人: 코에보에츠,아드리아누스헨드릭 , 돈더스,쇼에르트니콜라스람베르투스 , 카데,테오도루스페트루스마리아
- 申请人: 에이에스엠엘 네델란즈 비.브이.
- 申请人地址: P.O.Box ***, **** AH Veldhoven, The Netherlands
- 专利权人: 에이에스엠엘 네델란즈 비.브이.
- 当前专利权人: 에이에스엠엘 네델란즈 비.브이.
- 当前专利权人地址: P.O.Box ***, **** AH Veldhoven, The Netherlands
- 代理人: 특허법인(유)화우
- 优先权: US61/592,243 2012-01-30
- 国际申请: PCT/EP2013/051479 2013-01-25
- 国际公布: WO2013113633 2013-08-08
- 主分类号: H01L21/027
- IPC分类号: H01L21/027 ; G03F7/20
A lithographic apparatus, to a lithographic apparatus including a metrology system for measuring the position of the substrate table relative to the projection system and the projection system to image the pattern onto the substrate table, the substrate to receive the substrate . The metrology system to determine the position of the substrate table to the metrology frame, the metrology a grid position is fixed relative to the support frame, and the grid connected to the projection system and facing the grid associated with the substrate table It includes an encoder. The metrology frame has a bearing set (oriented) surface towards the substrate table, wherein the surface is, for example, was drawn Inserting or arranged to form a grid by etching.
信息查询:
EspacenetIPC结构图谱:
H | 电学 |
--H01 | 基本电气元件 |
----H01L | 半导体器件;其他类目未包含的电固体器件 |
------H01L21/00 | 专门适用于制造或处理半导体或固体器件或其部件的方法或设备 |
--------H01L21/02 | .半导体器件或其部件的制造或处理 |
----------H01L21/027 | ..未在H01L21/18或H01L21/34组中包含的为进一步的光刻工艺在半导体之上制作掩膜 |