基本信息:
- 专利标题： 하이 영역 적층 금속 구조들 및 관련된 방법들
- 专利标题（英）：High area stacked layered metallic structures and related methods
- 专利标题（中）：高面积堆叠层状金属结构及相关方法
- 申请号：KR1020147009202 申请日：2012-08-27
- 公开(公告)号：KR1020140074926A 公开(公告)日：2014-06-18
- 发明人： 스테파노우,필립제이슨 , 론데르간,안나랑겔로바 , 고우세브,이브게니페트로비치 , 셰노이,라빈드라바맨
- 申请人： 퀄컴 엠이엠에스 테크놀로지스, 인크.
- 申请人地址： **** Morehouse Drive, San Diego, CA *****-****, U.S.A.
- 专利权人： 퀄컴 엠이엠에스 테크놀로지스, 인크.
- 当前专利权人： 퀄컴 엠이엠에스 테크놀로지스, 인크.
- 当前专利权人地址： **** Morehouse Drive, San Diego, CA *****-****, U.S.A.
- 代理人： 특허법인 남앤드남
- 优先权： US13/227,246 2011-09-07
- 国际申请： PCT/US2012/052524 2012-08-27
- 国际公布： WO2013036394 2013-03-14
- 主分类号： B81C1/00
- IPC分类号： B81C1/00 ; C25D5/10 ; C25D5/18 ; C23C28/02 ; H01L21/28
This disclosure provides the implementation of the high surface area of the layered stack of metal structures, devices, apparatus, systems, and associated methods. A plurality of stacked layers on the substrate may be prepared from the plating bath containing a first metal and second metal. Modulation play that putting current may deposit the first metal layers and the alloy layers alternating, the alloy layer include a first metal and second metal. The gap between the alloy layers can be formed by selectively etching some parts of the first metal layer to define a stacked layered structure. The layered stack structure are capacitors, inductors, reactors with catalyst, heat transfer tubes, non-can be useful in applications to form the linear springs, filters, batteries and heavy metal cleaner.
信息查询:
EspacenetIPC结构图谱:
| B | 作业；运输 |
| --B81 | 微观结构技术 |
| ----B81C | 专门适用于制造或处理微观结构的装置或系统的方法或设备 |
| ------B81C1/00 | 在基片内或其上制造或处理的装置或系统 |