基本信息:
- 专利标题： 리소그래피 장치 및 방법
- 专利标题（英）：Lithographic apparatus and method
- 专利标题（中）：LITHOGRAPHIC设备和方法
- 申请号：KR1020147003960 申请日：2011-03-17
- 公开(公告)号：KR1020140027562A 公开(公告)日：2014-03-06
- 发明人： 야쿠닌,안드레이 , 바니네,바딤 , 루프스트라,에릭 , 반데르슈트,하르멘 , 스티븐스,루카스 , 반캠펜,마르텐
- 申请人： 에이에스엠엘 네델란즈 비.브이.
- 申请人地址： P.O.Box ***, **** AH Veldhoven, The Netherlands
- 专利权人： 에이에스엠엘 네델란즈 비.브이.
- 当前专利权人： 에이에스엠엘 네델란즈 비.브이.
- 当前专利权人地址： P.O.Box ***, **** AH Veldhoven, The Netherlands
- 代理人： 특허법인(유)화우
- 优先权： US61/358,645 2010-06-25; US61/362,981 2010-07-09
- 国际申请： PCT/EP2011/054057 2011-03-17
- 国际公布： WO2011160861 2011-12-29
- 主分类号： G03F1/62
- IPC分类号： G03F1/62 ; G02B5/08 ; G03F7/20
The lithographic apparatus includes a support configured to support the radiation source, and a patterning device configured to generate a radiation beam. The patterning device is configured to impart a pattern in a radiation beam to form a patterned radiation beam. The chamber is positioned between the source and the patterning device. Chamber is configured including at least one or more optical elements configured to reflect a beam of radiation, and the radiation from the radiation source to allow the passing through it. The membrane 44 is configured to allow passage of the radiation beam through the membrane, and preventing the passage of contaminant particles (54). A particle capturing structure 52 is configured to allow the inner chamber from the gas flowing along the bypass path to the outside chamber. Detour path is configured to substantially prevent the passage of contaminant particles (58) of the chamber to the outside through the inner chamber.
公开/授权文献:
- KR101846336B1 리소그래피 장치 및 방법 公开/授权日：2018-04-06
信息查询:
EspacenetIPC结构图谱:
| G | 物理 |
| --G03 | 摄影术；电影术；利用了光波以外其他波的类似技术；电记录术；全息摄影术 |
| ----G03F | 图纹面的照相制版工艺，例如，印刷工艺、半导体器件的加工工艺；其所用材料；其所用原版；其所用专用设备 |
| ------G03F1/00 | 用于图纹面的照相制版的原版的制备 |
| --------G03F1/62 | .薄膜或薄膜集合，例如在支持框架上具有薄膜；其制备 |