基本信息:
- 专利标题： 기판제조장치 및 기판제조방법
- 专利标题（英）：Device and method for producing substrate
- 专利标题（中）：用于生产基材的装置和方法
- 申请号：KR1020147000800 申请日：2012-07-17
- 公开(公告)号：KR1020140024953A 公开(公告)日：2014-03-03
- 发明人： 나카모리야스히토 , 이소케이지 , 오카모토유지
- 申请人： 스미도모쥬기가이고교 가부시키가이샤
- 申请人地址： *-*,Osaki *-chome Shinagawa-ku, Tokyo, Japan
- 专利权人： 스미도모쥬기가이고교 가부시키가이샤
- 当前专利权人： 스미도모쥬기가이고교 가부시키가이샤
- 当前专利权人地址： *-*,Osaki *-chome Shinagawa-ku, Tokyo, Japan
- 代理人： 방해철; 김용인
- 优先权： JPJP-P-2011-164874 2011-07-27; JPJP-P-2011-175170 2011-08-10
- 国际申请： PCT/JP2012/068118 2012-07-17
- 国际公布： WO2013015157 2013-01-31
- 主分类号： H05K3/28
- IPC分类号： H05K3/28 ; B05C13/02 ; B05D3/00
In the first coating station, to the one surface of the substrate, the thin film material of the liquid is applied, by not irradiating light to the thin film material is applied to the substrate is cured surface layer portion of the thin film material. The substrate to which the thin film material is applied in the first coating station is brought into the reversal station. With curing in a reverse station, not the inside of the thin film material by irradiating a light to the thin film material is applied to the substrate, to thereby invert the front and back of the substrate. And transferring the substrate to and between the conveying device, the first coating station and the reversing station. The control device, the first coating station, a reverse station, and controls the transportation device. The control device controls the transport device, the transport and the substrate not processed by the first application station in the reverse station.
信息查询:
EspacenetIPC结构图谱:
| H | 电学 |
| --H05 | 其他类目不包含的电技术 |
| ----H05K | 印刷电路；电设备的外壳或结构零部件；电气元件组件的制造 |
| ------H05K3/00 | 用于制造印刷电路的设备或方法 |
| --------H05K3/02 | .其中将导电材料敷至绝缘支承物的表面上，而后再将其导电材料从不希望让电流通导或屏蔽的表面区域中去除的 |
| ----------H05K3/28 | ..涂加非金属保护层 |