基本信息:
- 专利标题： 리소그래피 시스템, 변조 디바이스 및 광섬유 고정 기판의 제조 방법
- 专利标题（英）：Lithography system, modulation device and method of manufacturing a fiber fixation substrate
- 专利标题（中）：光刻系统，调制装置和制造光纤固定基板的方法
- 申请号：KR1020137013171 申请日：2011-10-26
- 公开(公告)号：KR1020130135258A 公开(公告)日：2013-12-10
- 发明人： 반멜레,랄프 , 반데페우트,테우니스 , 데르크스,헨크
- 申请人： 마퍼 리쏘그라피 아이피 비.브이.
- 申请人地址： Computerlaan **, NL-**** XK Delft, The Netherlands
- 专利权人： 마퍼 리쏘그라피 아이피 비.브이.
- 当前专利权人： 마퍼 리쏘그라피 아이피 비.브이.
- 当前专利权人地址： Computerlaan **, NL-**** XK Delft, The Netherlands
- 代理人： 특허법인 남앤드남
- 优先权： US61/406,675 2010-10-26; US61/477,228 2011-04-20; US61/479,263 2011-04-26
- 国际申请： PCT/EP2011/068801 2011-10-26
- 国际公布： WO2012055936 2012-05-03
- 主分类号： H01J37/04
- IPC分类号： H01J37/04 ; H01J37/22 ; H01J37/317
Using a plurality of charged particle beamlets charged to transfer the pattern to the surface of the target-particle multi-beamlet lithography system. The system includes a beam generator, a projection system for projecting the beamlet blanker array (beamlet blanker array) for patterning a plurality of beamlets, and the patterned beamlets to the target surface in accordance with the pattern to generate a plurality of charged particle beamlets It includes. Beamlet blanker array is arranged to include a plurality of modulators and a plurality of photo-sensing device, wherein the photosensitive device receives the pattern data carrying light beam and convert the light beam into an electric signal, the light sensing element to provide the received pattern data to one or more modulators being electrically connected to the one or more than one modulator, and beamlet blanker array provides the pattern data carrying light beam as a group assembly having a fixed connection It is coupled to the fiber fixing substrate for receiving the end sections of the plurality of fibers to.
公开/授权文献:
- KR101707541B1 리소그래피 시스템, 변조 디바이스 및 광섬유 고정 기판의 제조 방법 公开/授权日：2017-02-16