基本信息:
- 专利标题： 레이저 특성화 처리 시스템 및 방법
- 专利标题（英）：Laser characterization system and process
- 专利标题（中）：激光特性系统与工艺
- 申请号：KR1020137016836 申请日：2011-12-01
- 公开(公告)号：KR1020130121896A 公开(公告)日：2013-11-06
- 发明人： 왕,인 , 위소키,제라드,피. , 시에,펭 , 자,청-은
- 申请人： 코닝 인코포레이티드
- 申请人地址： One Riverfront Plaza, Corning, NY ***** U.S.A.
- 专利权人： 코닝 인코포레이티드
- 当前专利权人： 코닝 인코포레이티드
- 当前专利权人地址： One Riverfront Plaza, Corning, NY ***** U.S.A.
- 代理人： 청운특허법인
- 优先权： US61/419,042 2010-12-02
- 国际申请： PCT/US2011/062752 2011-12-01
- 国际公布： WO2012075215 2012-06-07
- 主分类号： H01S3/1055
- IPC分类号： H01S3/1055 ; H01S3/101
The present invention relates to a system and method for automatically characterizing treated with a plurality of external cavity semiconductor laser chip on the semiconductor bar is separated from the semiconductor wafer. The system includes a diffraction grating mounted on a rotating stage for rotating the diffraction grating through an angular range; The surface is oriented in a vertical and a diffraction grating mounted on a rotating stage to adjust the mirror; Laser analyzers; And a laser bar positioning stage. Positioning of the stage is automatically moved in order to align with chipssik grating a laser chips each laser bar on the stage at a time, and as a result, a portion of the laser beam emitted from the laser chip in the laser bar lattice to lock the lasing of the laser is reflected back in the same chip by primary diffraction, and the remaining laser beam is reflected by the mirror adjustment is processed is received by the analyzers characterization. For each laser transport, the rotation stage is automatically rotated to rotate the diffraction grating through the diffraction angle range for the laser beam emitted by the laser chip, the laser analyzer laser optical properties, such as spectrum, power or spatial mode the process characterized by automatically at each diffraction angle.
信息查询:
EspacenetIPC结构图谱:
| H | 电学 |
| --H01 | 基本电气元件 |
| ----H01S | 利用受激发射的器件 |
| ------H01S3/00 | 激光器，即利用受激发射对红外光、可见光或紫外线进行产生、放大、调制、解调或变频的器件 |
| --------H01S3/10 | .控制辐射的强度、频率、相位、极化或方向，例如开关、选通、调制或解调 |
| ----------H01S3/102 | ..由控制激活媒质，例如通过控制激励的方法或设备 |
| ------------H01S3/1055 | ...反射器之一是由绕射光栅构成的 |