基本信息:
- 专利标题: 리소그래피 장치 및 디바이스 제조 방법
- 专利标题(英):Lithographic apparatus and device manufacturing method
- 专利标题(中):光刻设备和器件制造方法
- 申请号:KR1020137015436 申请日:2011-11-15
- 公开(公告)号:KR1020130087041A 公开(公告)日:2013-08-05
- 发明人: 반즈웻에르윈존 , 드야거피터빌렘허만 , 온브리요하네스 , 드만헨드릭
- 申请人: 에이에스엠엘 네델란즈 비.브이.
- 申请人地址: P.O.Box ***, **** AH Veldhoven, The Netherlands
- 专利权人: 에이에스엠엘 네델란즈 비.브이.
- 当前专利权人: 에이에스엠엘 네델란즈 비.브이.
- 当前专利权人地址: P.O.Box ***, **** AH Veldhoven, The Netherlands
- 代理人: 유미특허법인
- 优先权: US61/420,965 2010-12-08
- 国际申请: PCT/EP2011/070147 2011-11-15
- 国际公布: WO2012076300 2012-06-14
- 主分类号: G03F7/20
- IPC分类号: G03F7/20 ; G03F7/26
The system is provided for controlling the focus of a maskless lithographic apparatus, this is provided with a projection system for projecting the image of the programmable patterning device onto a substrate. The first actuator system is configured to move the lens of the at least one lens of the projection system in a direction perpendicular to the optical axis of the projection system. Radiation beam expander configured to project an image of the programmable patterning device on the lens is also provided. Further, in order to control the focus of the image it projected on the substrate, in a direction parallel to the optical axis of the projection system is provided with a second actuator being configured to move the radiation beam expander.
公开/授权文献:
- KR101501967B1 리소그래피 장치 및 디바이스 제조 방법 公开/授权日:2015-03-12