基本信息:
- 专利标题： 가스를 분석하기 위한 장치 및 방법, 그리고 관련된 측정 스테이션
- 专利标题（英）：Device and method for analysing gas and associated measurement station
- 专利标题（中）：用于分析气体和相关测量站的装置和方法
- 申请号：KR1020127000793 申请日：2010-06-11
- 公开(公告)号：KR1020120070554A 公开(公告)日：2012-06-29
- 发明人： 파브르아르노 , 고도에르완 , 발레베르트랑
- 申请人： 파이퍼 배큠
- 申请人地址： ** Avenue de Brogny, ***** Annecy, France
- 专利权人： 파이퍼 배큠
- 当前专利权人： 파이퍼 배큠
- 当前专利权人地址： ** Avenue de Brogny, ***** Annecy, France
- 代理人： 양영준; 안국찬
- 优先权： FR0902850 2009-06-12
- 国际申请： PCT/EP2010/058251 2010-06-11
- 国际公布： WO2010142792 2010-12-16
- 主分类号： G01N33/00
- IPC分类号： G01N33/00 ; B01D46/00
The present invention relates to a station for measuring the gas contamination transport enclosure of a semiconductor substrate comprising a gas analyzer for determining the concentration of the gas to be analyzed, wherein the analysis device is a gas to be analyzed according to the dilution factor (D) of the flow (Q) to the diluting unit (3) configured to dilution, to sample the flow (Qa) of the gas is diluted by the pump and in communication with the dilution unit (3) by a sampling pipe (7) at least one comprises an analysis unit (5) including a processing means, said processing means according to the flow (Qa) and the dilution factor (D) of the analysis of the flow (Qa) of the sampled diluent gas, and analyzing the diluent gas It is configured to determine the concentration (C) of the flow (Q) of the gas to be analyzed. The invention also relates to the associated gas analysis method.
公开/授权文献:
- KR101757944B1 가스를 분석하기 위한 장치 및 방법, 그리고 관련된 측정 스테이션 公开/授权日：2017-07-13
信息查询:
EspacenetIPC结构图谱:
| G | 物理 |
| --G01 | 测量；测试 |
| ----G01N | 借助于测定材料的化学或物理性质来测试或分析材料 |
| ------G01N33/00 | 利用不包括在G01N1/00至G01N31/00组中的特殊方法来研究或分析材料 |