发明公开
KR1020120051740A 플라즈마 발생 파편으로부터 EUV 광원의 내부 구성품을 보호하기 위한 시스템
失效 - Ended(transfer of patent right)
基本信息:
- 专利标题: 플라즈마 발생 파편으로부터 EUV 광원의 내부 구성품을 보호하기 위한 시스템
- 专利标题(英):Systems for protecting internal components of an euv light source from plasma-generated debris
- 专利标题(中):用于保护来自等离子体生物反应器的EUV光源的内部组分的系统
- 申请号:KR1020127007046 申请日:2006-02-24
- 公开(公告)号:KR1020120051740A 公开(公告)日:2012-05-22
- 发明人: 보워링노보트알. , 한손브존에이.,엠. , 바이카노프알렉산더엔. , 코디킨올레 , 엘쇼프알렉산더아이. , 파틀로윌리엄엔.
- 申请人: 사이머 엘엘씨
- 申请人地址: ***** Thornmint Court, San Diego, CA *****-****, U.S.A.
- 专利权人: 사이머 엘엘씨
- 当前专利权人: 사이머 엘엘씨
- 当前专利权人地址: ***** Thornmint Court, San Diego, CA *****-****, U.S.A.
- 代理人: 송봉식; 정삼영
- 优先权: US11/067,099 2005-02-25
- 国际申请: PCT/US2006/006408 2006-02-24
- 国际公布: WO2006093781 2006-09-08
- 主分类号: H05G2/00
- IPC分类号: H05G2/00 ; H05H1/00
From debris generated by plasma formation, the system and method for protecting an EUV light source plasma production chamber optical element surface is disclosed. In one embodiment of the present invention, there is disclosed a shield which includes at least a position between the optical device and the plasma formation site a hollow tube. The tube is through the reflection of a relatively small angle to capture the debris towards that light passes through the lumen of the tube. In another embodiment of the invention, the shield is disclosed to be heated to a temperature sufficient to remove one or more species of the debris material deposited on the shield. In another embodiment of the invention, the shield is moved to the cleaning chamber system is disclosed which is shielded from the light source is a plasma cleaning chamber.
公开/授权文献:
- KR101173080B1 플라즈마 발생 파편으로부터 EUV 광원의 내부 구성품을 보호하기 위한 시스템 公开/授权日:2012-08-13
信息查询:
EspacenetIPC结构图谱:
H | 电学 |
--H05 | 其他类目不包含的电技术 |
----H05G | X射线技术 |
------H05G2/00 | 没有X射线管的、专用于产生X射线的设备或方法,如有等离子产生 |