基本信息:
- 专利标题： 가스 공급장치
- 专利标题（英）：Gas supply device
- 专利标题（中）：气体供应装置
- 申请号：KR1020117020374 申请日：2010-02-26
- 公开(公告)号：KR1020110123254A 公开(公告)日：2011-11-14
- 发明人： 하야시다쓰야
- 申请人： 가부시키가이샤 호리바 에스텍
- 申请人地址： **-* Hokodate-cho Kamitoba, Minami-ku, Kyoto-shi, Kyoto, Japan
- 专利权人： 가부시키가이샤 호리바 에스텍
- 当前专利权人： 가부시키가이샤 호리바 에스텍
- 当前专利权人地址： **-* Hokodate-cho Kamitoba, Minami-ku, Kyoto-shi, Kyoto, Japan
- 代理人： 강일우; 이경희; 이구해; 정석원; 전재윤; 이상혁; 조휘건
- 优先权： JPJP-P-2009-051407 2009-03-04
- 国际申请： PCT/JP2010/053038 2010-02-26
- 国际公布： WO2010101077 2010-09-10
- 主分类号： F17C9/02
- IPC分类号： F17C9/02
Tank present is invention, and the vaporized gas by at least heating means need to prevent the liquefied again, is in a compact configuration gas supply apparatus capable of greatly reducing the installation area, material solution (M) is stored 1 and is connected through the interior of the first valve unit 31 of the tank 1, gas having a mass-flow controller (2) for controlling the flow rate of the material solution (M) is a vaporized gas a supply device 100, and the inner flow path 13 inside the outer wall of the tank (1) is formed, the inner passage, the first for connecting the inside and the first inlet port (31i) of the tank (1) valve inlet passage 131, a first outlet port (31o) of the first derivation generation gas includes a valve outlet passage 132 line (Gout) for connecting the inlet (H) of the massflow controller (2) It was provided.
信息查询:
EspacenetIPC结构图谱:
| F | 机械工程；照明；加热；武器；爆破 |
| --F17 | 气体或液体的贮存或分配 |
| ----F17C | 盛装或贮存压缩的、液化的或固化的气体容器；固定容量的贮气罐；将压缩的、液化的或固化的气体灌入容器内，或从容器内排出 |
| ------F17C9/00 | 自非压力容器排放液化或固化气体的方法或装置 |
| --------F17C9/02 | .改变状态的，例如汽化 |