基本信息:
- 专利标题: 광 경화성 전사 시트 및 이를 사용한 요철 패턴의 형성 방법
- 专利标题(英):Photocurable transfer sheet, and method for forming uneven pattern using same
- 专利标题(中):光电转印片,以及使用其形成未图案的方法
- 申请号:KR1020117018303 申请日:2010-01-08
- 公开(公告)号:KR1020110112412A 公开(公告)日:2011-10-12
- 发明人: 이나미야다까또 , 하시모또마사시 , 가이다에이조
- 申请人: 가부시키가이샤 브리지스톤
- 申请人地址: *-*, Kyobashi *-chome, Chuo-ku, Tokyo, Japan
- 专利权人: 가부시키가이샤 브리지스톤
- 当前专利权人: 가부시키가이샤 브리지스톤
- 当前专利权人地址: *-*, Kyobashi *-chome, Chuo-ku, Tokyo, Japan
- 代理人: 장수길; 이중희
- 优先权: JPJP-P-2009-002188 2009-01-08
- 国际申请: PCT/JP2010/050134 2010-01-08
- 国际公布: WO2010079820 2010-07-15
- 主分类号: H01L21/027
- IPC分类号: H01L21/027 ; B29C59/02 ; G11B7/26
The invention in a nanoimprint process method, and that can be advantageously used in the preparation of the intermediate stamper photo-curable transfer sheet, this time with a concave-convex pattern from the releasable and its intermediate stamper and the mold having a minute uneven pattern used transfer product excellent in the removability of the photocurable resin, and provides a method for forming a fine concave-convex pattern adhesion to the base film using the same as the preferred photo-curable transfer sheet, it added. A deformable photo-curable composition the photo-curable transfer sheet 10 having the photo-curable transfer layer 11 is made of by pressure, wherein the photo-curable composition, comprising a ethylenic compound containing a silicone resin and / or fluorine atom as a Yun Hwalje and it provides a photo-curable transfer sheet (10) characterized in that photo-curable transfer layer 11 is the surface energy of less than 20 mN / m more than 30 mN / m in. In addition, a method for forming a concave-convex pattern using the same.
信息查询:
EspacenetIPC结构图谱:
H | 电学 |
--H01 | 基本电气元件 |
----H01L | 半导体器件;其他类目未包含的电固体器件 |
------H01L21/00 | 专门适用于制造或处理半导体或固体器件或其部件的方法或设备 |
--------H01L21/02 | .半导体器件或其部件的制造或处理 |
----------H01L21/027 | ..未在H01L21/18或H01L21/34组中包含的为进一步的光刻工艺在半导体之上制作掩膜 |