基本信息:
- 专利标题: 적층 구조를 갖는 반도체 메모리 장치 및 그 제조 방법
- 专利标题(英):Stacked memory device and method of fabricating the same
- 专利标题(中):堆叠存储器件及其制造方法
- 申请号:KR1020100024404 申请日:2010-03-18
- 公开(公告)号:KR1020110105255A 公开(公告)日:2011-09-26
- 发明人: 박철우 , 황홍선 , 백인규 , 손동현
- 申请人: 삼성전자주식회사
- 申请人地址: ***, Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do, Republic of Korea
- 专利权人: 삼성전자주식회사
- 当前专利权人: 삼성전자주식회사
- 当前专利权人地址: ***, Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do, Republic of Korea
- 代理人: 박상수
- 主分类号: H01L21/8247
- IPC分类号: H01L21/8247 ; H01L27/115
The semiconductor memory device of the multilayer structure which has a memory cell array layers with independent connecting layer is disclosed. The semiconductor memory device includes a semiconductor substrate, a plurality of memory cell array layers, and at least one connecting layer having a function circuit. A memory cell array layers are stacked on the semiconductor substrate. Connection layers are stacked on top of a semiconductor substrate with the memory cell array layers independently, and connects the selected line of memory cells arranged in the memory cell array layers, the function circuit electrically. Accordingly, the semiconductor memory device has a high flexibility in the lamination process.
信息查询:
EspacenetIPC结构图谱:
H | 电学 |
--H01 | 基本电气元件 |
----H01L | 半导体器件;其他类目未包含的电固体器件 |
------H01L21/00 | 专门适用于制造或处理半导体或固体器件或其部件的方法或设备 |
--------H01L21/67 | .专门适用于在制造或处理过程中处理半导体或电固体器件的装置;专门适合于在半导体或电固体器件或部件的制造或处理过程中处理晶片的装置 |
----------H01L21/71 | ..限定在组H01L21/70中的器件的特殊部件的制造 |
------------H01L21/78 | ...把衬底连续地分成多个独立的器件 |
--------------H01L21/782 | ....制造多个器件,每一个由单个电路元件组成 |
----------------H01L21/822 | .....衬底是采用硅工艺的半导体的 |
------------------H01L21/8222 | ......双极工艺 |
--------------------H01L21/8234 | .......MIS工艺 |
----------------------H01L21/8239 | ........存储器结构 |
------------------------H01L21/8246 | .........只读存储器结构(ROM) |
--------------------------H01L21/8247 | ..........电可编程序的 |