基本信息:
- 专利标题： 액추에이터 시스템, 리소그래피 장치, 구성요소의 위치 제어방법, 및 디바이스 제조방법
- 专利标题（英）：Actuator system, lithographic apparatus, method of controlling the position of a component and device manufacturing method
- 专利标题（中）：执行器系统，平面设备，控制部件位置的方法和装置制造方法
- 申请号：KR1020117015440 申请日：2009-11-04
- 公开(公告)号：KR1020110099299A 公开(公告)日：2011-09-07
- 发明人： 데브리스,고쎄 , 부이스,에드빈 , 믹칸,우베
- 申请人： 에이에스엠엘 네델란즈 비.브이.
- 申请人地址： P.O.Box ***, **** AH Veldhoven, The Netherlands
- 专利权人： 에이에스엠엘 네델란즈 비.브이.
- 当前专利权人： 에이에스엠엘 네델란즈 비.브이.
- 当前专利权人地址： P.O.Box ***, **** AH Veldhoven, The Netherlands
- 代理人： 특허법인(유)화우
- 优先权： US61/122,336 2008-12-12
- 国际申请： PCT/EP2009/064605 2009-11-04
- 国际公布： WO2010066515 2010-06-17
- 主分类号： H01L21/027
- IPC分类号： H01L21/027 ; G03F7/20 ; F03G7/06
The actuator system is provided that is configured to move the component to the base of the actuator system. The actuator system includes two material sections having a first actuating element and the second comprising the actuating element, each of which are bonded to each other to different thermal expansion coefficients. Two actuating elements, if the rising one temperature of them the other one of the actuators to increase the temperature of the biting element the other of the actuators onto the component with a force in the opposite direction applied by the floating element to be adapted to the force. The actuator system further comprises a first actuating element and a second actuator at least one power supply is configured to provide a controllable heating element independently of the Exfoliating portion.
信息查询:
EspacenetIPC结构图谱:
| H | 电学 |
| --H01 | 基本电气元件 |
| ----H01L | 半导体器件；其他类目未包含的电固体器件 |
| ------H01L21/00 | 专门适用于制造或处理半导体或固体器件或其部件的方法或设备 |
| --------H01L21/02 | .半导体器件或其部件的制造或处理 |
| ----------H01L21/027 | ..未在H01L21/18或H01L21/34组中包含的为进一步的光刻工艺在半导体之上制作掩膜 |