基本信息:
- 专利标题： 감광성 수지 조성물
- 专利标题（英）：Photosensitive resin composition
- 专利标题（中）：感光树脂组合物
- 申请号：KR1020087000270 申请日：2006-01-24
- 公开(公告)号：KR1020080014147A 公开(公告)日：2008-02-13
- 发明人： 무라타요시아키 , 이토우히로노부
- 申请人： 디아이씨 가부시끼가이샤
- 申请人地址： **-**, Sakashita *-chome, Itabashi-ku, Tokyo ***-****, Japan
- 专利权人： 디아이씨 가부시끼가이샤
- 当前专利权人： 디아이씨 가부시끼가이샤
- 当前专利权人地址： **-**, Sakashita *-chome, Itabashi-ku, Tokyo ***-****, Japan
- 代理人： 문두현; 문기상
- 优先权： JPJP-P-2005-00191846 2005-06-30
- 国际申请： PCT/JP2006/301019 2006-01-24
- 国际公布： WO2007004334 2007-01-11
- 主分类号： G03F7/027
- IPC分类号： G03F7/027
摘要：
This invention provides a photosensitive resin composition comprising an acid group-containing vinyl ester resin and a photopolymerization initiator as indispensable components. The acid group-containing vinyl ester resin has a multiple branching molecular structure and is produced by reacting an epoxy vinyl ester resin, obtained by reacting a novolak epoxy resin with acrylic acid, with a polybasic acid anhydride, then reacting the acid group, formed by the reaction, with glycidyl methacrylate, and further reacting the secondary hydroxyl group, formed by this reaction, with a polybasic acid anhydride. The acid group-containing vinyl ester resin contains 1.75 to 3.5 radically polymerizable unsaturated double bonds per aromatic ring and contains the acid group in such an amount range that the acid value is 30 to 150 mg KOH/g. The photosensitive resin composition is a resin composition for a resist ink that simultaneously has ultrahigh sensitivity, excellent developability, and a broad heat control width.
摘要（中）：
本发明提供了含有含酸基的乙烯基酯树脂和光聚合引发剂作为不可或缺的成分的感光性树脂组合物。 含酸基的乙烯基酯树脂具有多支化分子结构，并且通过使酚醛清漆环氧树脂与丙烯酸反应获得的环氧乙烯基酯树脂与多元酸酐反应制得，然后使酸基由 与甲基丙烯酸缩水甘油酯反应，并使通过该反应形成的仲羟基与多元酸酐反应。 含酸基的乙烯基酯树脂每个芳环含有1.75〜3.5个可自由基聚合的不饱和双键，其酸值为酸值为30〜150mgKOH / g。 感光性树脂组合物是同时具有超高灵敏度，优异的显影性和宽的热控制宽度的抗蚀剂油墨用树脂组合物。
公开/授权文献:
- KR100935148B1 감광성 수지 조성물 公开/授权日：2010-01-06