基本信息:
- 专利标题： 감광성 수지, 수지 조성물 및 그의 경화물
- 专利标题（英）：Photosensitive resins, resin compositions and products of curing thereof
- 专利标题（中）：光敏树脂，树脂组合物及其固化产物
- 申请号：KR1020047013117 申请日：2003-02-25
- 公开(公告)号：KR1020040086430A 公开(公告)日：2004-10-08
- 发明人： 고야나기히로오 , 나카야마고지 , 우메야마치에 , 가와다요시히로 , 요코시마미노루
- 申请人： 니폰 가야꾸 가부시끼가이샤
- 申请人地址： *-*, Marunouchi *-chome, Chiyoda-ku, Tokyo JAPAN
- 专利权人： 니폰 가야꾸 가부시끼가이샤
- 当前专利权人： 니폰 가야꾸 가부시끼가이샤
- 当前专利权人地址： *-*, Marunouchi *-chome, Chiyoda-ku, Tokyo JAPAN
- 代理人： 최규팔
- 优先权： JPJP-P-2002-00048865 2002-02-26; JPJP-P-2002-00299047 2002-10-11; JPJP-P-2002-00302101 2002-10-16
- 国际申请： PCT/JP2003/002081 2003-02-25
- 国际公布： WO2003072634 2003-09-04
- 主分类号： C08G63/91
- IPC分类号： C08G63/91 ; C08F290/06 ; C08L67/06 ; G02B6/122
The invention, substantially formed from the reaction product of a polyol compound (a) and a tetrabasic acid dianhydride (b) the reaction product of the polyester compound (c) and compound (d) having an ethylenically unsaturated group and an epoxy group in the molecule of the photosensitive resin (a), or diluent (XX) as necessary to an alkali-soluble photosensitive resin (AA), the photosensitive resin which is obtained in the photosensitive resin (a), by reacting a 2 or 3 nucleotide acid 1 anhydride (e), cross-linking agent (B), photo-polymerization as initiator (C) of the goods with a photosensitive resin composition and its cured product, a cured formulation, the resin and the resin composition is suitable, workability, transparency, developing such an optical waveguide-forming properties, adhesiveness, solder heat resistance, etc. and provides an excellent cured product.
公开/授权文献:
- KR100974053B1 감광성 수지, 수지 조성물 및 그의 경화물 公开/授权日：2010-08-04
信息查询:
EspacenetIPC结构图谱:
| C | 化学；冶金 |
| --C08 | 有机高分子化合物；其制备或化学加工；以其为基料的组合物 |
| ----C08G | 用碳—碳不饱和键以外的反应得到的高分子化合物 |
| ------C08G63/00 | 由在高分子主链上形成羧酸酯键的反应制得的高分子化合物 |
| --------C08G63/91 | .用化学后处理改性的聚合物 |