基本信息:
- 专利标题： 테트라플루오로실란의 제조방법 및 용도
- 专利标题（英）：Production and use of tetrafluorosilane
- 专利标题（中）：테트라플루오로실란의제조방법및용도
- 申请号：KR1020047000371 申请日：2002-07-11
- 公开(公告)号：KR1020040013138A 公开(公告)日：2004-02-11
- 发明人： 아토베히토시 , 오카마사카주 , 카네코토라이치
- 申请人： 쇼와 덴코 가부시키가이샤
- 申请人地址： **-*, Shibadaimon *-chome, Minato-ku, Tokyo ***-****, Japan
- 专利权人： 쇼와 덴코 가부시키가이샤
- 当前专利权人： 쇼와 덴코 가부시키가이샤
- 当前专利权人地址： **-*, Shibadaimon *-chome, Minato-ku, Tokyo ***-****, Japan
- 代理人： 하상구; 하영욱
- 优先权： JPJP-P-2001-00212890 2001-07-12
- 国际申请： PCT/JP2002/007069 2002-07-11
- 国际公布： WO2003006374 2003-01-23
- 主分类号： C01B33/107
- IPC分类号： C01B33/107
A step of heating a silicate-hexafluoro-1, step (2-1) of reacting a silane gas and a fluorine gas containing a tetrafluoroethylene-hexafluoro-Lodi siloxane generated in the step (1), wherein the step (1) the hexafluoro-step of Lodi plateau siloxane and silane gas tetrafluoroethylene containing a self-metal fluoride as a reaction product in (2-2), or a silane containing a tetrafluoroethylene-hexafluoro-Lodi siloxane generated in the step (1) by the gas to a process comprising the fluorine gas and the reaction step (2-1) and step (2-3) of hypervalent metal fluoride and reacting the silane gas as the tetrafluoroborate produced in the step (2-1) of tetra to prepare a silane-fluoro. In addition, the analysis of the impurities in a high purity silane tetrafluoroborate.
公开/授权文献:
- KR100636659B1 테트라플루오로실란의 제조방법 및 용도 公开/授权日：2006-10-19