基本信息:
- 专利标题： 포토레지스트용스트리퍼조성물
- 专利标题（英）：Stripper compound for photoresist
- 专利标题（中）：剥离剂化合物
- 申请号：KR1019980027782 申请日：1998-07-10
- 公开(公告)号：KR1020000008103A 公开(公告)日：2000-02-07
- 发明人： 김진석 , 길준잉 , 박동진 , 박상오 , 이춘득 , 임석영 , 김양선
- 申请人： 삼성전자주식회사
- 申请人地址： ***, Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do, Republic of Korea
- 专利权人： 삼성전자주식회사
- 当前专利权人： 삼성전자주식회사
- 当前专利权人地址： ***, Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do, Republic of Korea
- 代理人： 유미특허법인; 김원근
- 主分类号： G03F7/42
- IPC分类号： G03F7/42
摘要：
PURPOSE: A stripper compound for a photoresist is to prevent a generation of an impurity particle in the case that separating a photoresist. CONSTITUTION: A stripper compound for a photoresist comprises: an alkaneolamine with 5 to 15 weight percent, wherein the alkaneolamine is compounds selected from a group having a monoisopropanolamine and a monoethanolamine; a sulfoxide or a sulfon compound with 35 to 55 weight percent wherein the sulfoxide compound is compounds selected from a group having a dimethylsulfoxide and a diethylesulfoside, and the sulfon compound is compounds selected from a group having a diethylesulfon and a dimethylesulfon; and glycolether with 35 to 55 weight percent. A boundary tension is improved and an evaporation loss is decreased such that a using time is increased.
摘要（中）：
目的：用于光致抗蚀剂的剥离剂化合物是在分离光致抗蚀剂的情况下防止产生杂质颗粒。 构成：用于光致抗蚀剂的剥离剂化合物包括：具有5至15重量％的链烷醇胺，其中链烷醇胺是选自具有单异丙醇胺和单乙醇胺的化合物; 具有35至55重量％的亚砜或磺化合物，其中所述亚砜化合物是选自具有二甲基亚砜和二乙基亚磺酰基的基团的化合物，并且所述磺化合物是选自具有二乙基乙烷和二甲基磺酸的化合物; 和35-55重量％的糖醇醚。 边界张力提高，蒸发损失降低，使用时间增加。
公开/授权文献:
- KR100288769B1 포토레지스트용스트리퍼조성물 公开/授权日：2001-09-17