基本信息:
- 专利标题： 기판 처리 장치, 디바이스 제조 시스템 및 디바이스 제조 방법
- 专利标题（英）：KR101848590B1 - Substrate processing device, device manufacturing system and device manufacturing method
- 申请号：KR1020177010559 申请日：2012-10-11
- 公开(公告)号：KR101848590B1 公开(公告)日：2018-04-12
- 发明人： 가토마사키
- 申请人： 가부시키가이샤 니콘
- 申请人地址： *-**-*, Konan, Minato-ku, Tokyo, Japan
- 专利权人： 가부시키가이샤 니콘
- 当前专利权人： 가부시키가이샤 니콘
- 当前专利权人地址： *-**-*, Konan, Minato-ku, Tokyo, Japan
- 代理人： 특허법인태평양
- 优先权： JPJP-P-2011-278290 2011-12-20; JPJP-P-2012-024058 2012-02-07
- 国际申请： PCT/JP2012/076326 2012-10-11
- 国际公布： WO2013094286 2013-06-27
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G02B13/22 ; G02B13/24 ; G02B17/00 ; G02B17/08 ; G03F7/24
The substrate processing device 1011, so as to follow the illumination region (IR) and the projection area first face (p1001) a curved in a cylindrical shape with a predetermined curvature in the one side region of the (PA), the first object (M) and a second object the first support member 1021, and, to conform to a predetermined second plane (p1002) in the other area of the illumination region and the projection region, the first object and the second object which supports the one side (p) and a second support member 1022 for supporting a side of the other. A projection optical system (PL) is, of the principal ray on the image up to the projection area from the illumination area of light, the first surface and the projection is the principal ray between the optical system, the first surface in the radial direction to one towards the second surface and the non-perpendicular to the radial direction of the , and a biasing member for propagating the image-forming light beam.
公开/授权文献:
- KR1020170045389A 기판 처리 장치, 디바이스 제조 시스템 및 디바이스 제조 방법 公开/授权日：2017-04-26