基本信息:
- 专利标题： 필름의 노광 장치
- 专利标题（英）：Film exposure device
- 申请号：KR1020137008832 申请日：2011-08-16
- 公开(公告)号：KR101798694B1 公开(公告)日：2017-11-16
- 发明人： 미즈무라미치노부
- 申请人： 브이 테크놀로지 씨오. 엘티디
- 申请人地址： *** Godo-Cho, Hodogaya-Ku, Yokohama-shi, Kanagawa ***-**** (JP)
- 专利权人： 브이 테크놀로지 씨오. 엘티디
- 当前专利权人： 브이 테크놀로지 씨오. 엘티디
- 当前专利权人地址： *** Godo-Cho, Hodogaya-Ku, Yokohama-shi, Kanagawa ***-**** (JP)
- 代理人： 장수길; 성재동
- 优先权： JPJP-P-2010-199359 2010-09-06
- 国际申请： PCT/JP2011/068573 2011-08-16
- 国际公布： WO2012032903 2012-03-15
- 主分类号： G03F9/00
- IPC分类号： G03F9/00 ; G03F7/20 ; H05K1/02 ; H05K3/00
The exposure apparatus (1) of film, and the initial position the incoming mark forming part 13 to form a lead-mark (2a) is based on the mask 12 to the leading end of the film (2) to be supplied are provided, the detector by 15, and it detects the position of the lead-in mark in a direction perpendicular to the moving direction of the film. Then, by adjusting the position of the mask on the detection result. Incoming mark, for example, formed by a YAG laser. Detector is, for example, a line CCD camera arranged at the bottom of the mask. Thereby, the film exposure apparatus, when starting the exposure of the film, by setting the position of the mask with high precision, it is possible to reliably exposing the film to a high exposure accuracy.
公开/授权文献:
- KR1020130102586A 필름의 노광 장치 公开/授权日：2013-09-17