基本信息:
- 专利标题： 블록 공중합체의 자가-조립에 의해 기판에 이격된 리소그래피 피처들을 제공하는 방법들
- 专利标题（英）：Methods for providing spaced lithography features on a substrate by self-assembly of block copolymers
- 申请号：KR1020157029430 申请日：2014-02-26
- 公开(公告)号：KR101721127B1 公开(公告)日：2017-03-29
- 发明人： 핀데르스,요제프 , 부이스터,산더 , 반데르헤이덴,에디 , 부츠,헨리
- 申请人： 에이에스엠엘 네델란즈 비.브이.
- 申请人地址： P.O.Box ***, **** AH Veldhoven, The Netherlands
- 专利权人： 에이에스엠엘 네델란즈 비.브이.
- 当前专利权人： 에이에스엠엘 네델란즈 비.브이.
- 当前专利权人地址： P.O.Box ***, **** AH Veldhoven, The Netherlands
- 代理人： 특허법인(유)화우
- 优先权： US61/792,117 2013-03-15
- 国际申请： PCT/EP2014/053694 2014-02-26
- 国际公布： WO2014139795 2014-09-18
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; B81C1/00 ; B82Y40/00 ; H01L21/027
The lithographic features spaced apart by a plurality of regularly, for example, a method of forming contact holes and, the method comprising the steps of: providing a trench in the substrate, the trench having a side wall and a base facing, sidewalls therebetween a has a width, the trench is formed by the photo lithography, the off-axis includes the step of exposing a substrate using a light, off-axis modulation is supplied to the trench sidewalls by exposure using the illumination; The method comprising: providing an assembly block copolymer available - woman having a first and a second block in the trench; The self-assembling block copolymers are available in order to self-aligned layer of the trench, the steps of the assembly, said layer having a second domain of the first domain and the second block of the first block; And a second comprising the step of selectively removing the first domain to the form at least one regularly spaced columns of the lithographic feature with the second domain along the trench.
公开/授权文献:
- KR1020150130540A 블록 공중합체의 자가-조립에 의해 기판에 이격된 리소그래피 피처들을 제공하는 방법들 公开/授权日：2015-11-23