基本信息:
- 专利标题： 입자성 물질의 연속적인 제거를 위한 필터링 시스템 및 이를 이용한 필터링 방법
- 专利标题（英）：Filtering system for continuous particle eliminate and filtering method using the same
- 专利标题（中）：用于连续粒子消除的过滤系统和使用其的过滤方法
- 申请号：KR1020150014969 申请日：2015-01-30
- 公开(公告)号：KR101714605B1 公开(公告)日：2017-03-09
- 发明人： 정창환 , 송영아 , 최균
- 申请人： 주식회사 이우이엔티
- 申请人地址： 경기도 안양시 동안구 시민대로 *** ,*동****호(관양동,에이스평촌타워)
- 专利权人： 주식회사 이우이엔티
- 当前专利权人： 주식회사 이우이엔티
- 当前专利权人地址： 경기도 안양시 동안구 시민대로 *** ,*동****호(관양동,에이스평촌타워)
- 代理人： 특허법인 대아
- 主分类号： B01D46/00
- IPC分类号： B01D46/00
The present invention for a filter system for continuously removed particles, especially sikimyeo by ultraviolet weakening the adhesive force by inducing the activity of the photoinitiator contained in the gas, to remove the particles contained in the gas by the roll filter and the rotary filter unit continuously It relates to a filtering system that can be. The present invention can thereby weakening the adhesive force by the pre-treatment gas to the ultraviolet light source to cure the photo initiator contained in the gas, preventing the photo-initiator is excessively attached to the filter. The present invention is a filter with a clean filter, and unwound with a filter using the filter roll is wound may be continuously removed by the particles contained in the gas by washing. The invention may also use parts of the rotating filter to rotate to the rear side of the roll filter to be more reliably the particles contained in the gas continuously removed.
公开/授权文献:
- KR1020160093987A 입자성 물질의 연속적인 제거를 위한 필터링 시스템 및 이를 이용한 필터링 방법 公开/授权日：2016-08-09
信息查询:
EspacenetIPC结构图谱:
| B | 作业；运输 |
| --B01 | 一般的物理或化学的方法或装置 |
| ----B01D | 分离 |
| ------B01D46/00 | 专门用于把弥散粒子从气体或蒸气中分离出来的经过改进的过滤器和过滤方法 |