基本信息:
- 专利标题： 감활성광선성 또는 감방사선성 수지 조성물 및 그 조성물을 이용한 패턴 형성 방법
- 专利标题（英）：Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the composition
- 专利标题（中）：化学敏感性或辐射敏感性树脂组合物及其与组合物形成图案的方法
- 申请号：KR1020157014632 申请日：2009-09-28
- 公开(公告)号：KR101702420B1 公开(公告)日：2017-02-03
- 发明人： 츠치무라토모타카 , 시라카와코지 , 츠치하시토루 , 츠바키히데아키
- 申请人： 후지필름 가부시키가이샤
- 申请人地址： *-**-**, Nishi Azabu, Minato-ku, Tokyo, Japan
- 专利权人： 후지필름 가부시키가이샤
- 当前专利权人： 후지필름 가부시키가이샤
- 当前专利权人地址： *-**-**, Nishi Azabu, Minato-ku, Tokyo, Japan
- 代理人： 하영욱
- 优先权： JPJP-P-2008-249192 2008-09-26; JPJP-P-2009-039905 2009-02-23
- 国际申请： PCT/JP2009/067292 2009-09-28
- 国际公布： WO2010035905 2010-04-01
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; C07C309/25 ; C07C309/29 ; C07C309/28 ; C07C309/38 ; C07C309/42 ; C07C323/66 ; C07C381/12 ; G03F7/038 ; G03F7/039
The following general formula sense of an actinic ray or last sense comprising any of the compounds of (I) a radiation-sensitive resin composition.
[From here:
Ar is - which may have a substituent other than (AB) group represents a good aromatic ring;
n is an integer from 2-5;
A is a single bond, an alkylene group, -O-, -S-, -C (= O) -, -S (= O) -, -S (= O) 2 - , and -OS (= O)
2 - in It represents any selected one or combination of two or more species, provided that -C (= O) O- is excluded;
B is the number of carbon atoms containing tertiary or quaternary carbon atom represents a cyclic aliphatic group-containing more than 3;
Two or more of - (AB) group is bonded to each other to the same as or different from each other;
M
+ represents an organic onium ion.]
公开/授权文献:
- KR1020150070418A 감활성광선성 또는 감방사선성 수지 조성물 및 그 조성물을 이용한 패턴 형성 방법 公开/授权日：2015-06-24