基本信息:
- 专利标题: 플라즈마용 광학 장치
- 专利标题(英):Optical apparatus for plasma
- 专利标题(中):等离子体光学仪器
- 申请号:KR1020090010547 申请日:2009-02-10
- 公开(公告)号:KR101520453B1 公开(公告)日:2015-05-20
- 发明人: 이헌정 , 채승기 , 한재원 , 오창훈
- 申请人: 삼성전자주식회사 , 연세대학교 산학협력단
- 申请人地址: ***, Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do, Republic of Korea
- 专利权人: 삼성전자주식회사,연세대학교 산학협력단
- 当前专利权人: 삼성전자주식회사,연세대학교 산학협력단
- 当前专利权人地址: ***, Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do, Republic of Korea
- 代理人: 특허법인 고려
- 主分类号: H01L21/205
- IPC分类号: H01L21/205 ; H05H1/24
The present invention provides an optical jangchieul plasma. This device is a plasma generation device of the window a through the target area from the emission in which light emission perspex column (optical emission spectrum) for receiving a light receiving lens, light receiving lens and the window between the place is out of focus (out focus) light blocking to a first aperture stop (aperture stop), a light receiving lens and is placed between the image-forming area of the light receiving lens in the focus being placed on the image formation area of the second aperture stop, and the light-receiving lenses to block the light pin to limit the focal depth of the target area It includes a hole (pin hole). Pinholes, OES, plasma, spatial distribution, the spatial resolution
公开/授权文献:
- KR1020100091378A 플라즈마용 광학 장치 公开/授权日:2010-08-19
信息查询:
EspacenetIPC结构图谱:
H | 电学 |
--H01 | 基本电气元件 |
----H01L | 半导体器件;其他类目未包含的电固体器件 |
------H01L21/00 | 专门适用于制造或处理半导体或固体器件或其部件的方法或设备 |
--------H01L21/02 | .半导体器件或其部件的制造或处理 |
----------H01L21/027 | ..未在H01L21/18或H01L21/34组中包含的为进一步的光刻工艺在半导体之上制作掩膜 |
------------H01L21/18 | ...器件有由周期表第Ⅳ族元素或含有/不含有杂质的AⅢBⅤ族化合物构成的半导体,如掺杂材料 |
--------------H01L21/20 | ....半导体材料在基片上的沉积,例如外延生长 |
----------------H01L21/205 | .....应用气态化合物的还原或分解产生固态凝结物的,即化学沉积 |