SUMMARY Embodiments of the present invention relates to a plasma power supply device combines the LC resonant two igniters that can be used in the semiconductor process, the plasma power supply device according to an embodiment of the present invention, a, LC resonance in the plasma power supply device utilized to generate a high-frequency high voltage after generating a primary gas discharge in the vacuum chamber containing the same electrically second amplification by LC resonant two ignition unit for generate an initial plasma to generate a unipolar rectangular wave immediately following the initial plasma generation, applying the initial plasma may comprise a sustain pulse generating unit for inducing a stable plasma state, and the two are connected to the ignition unit, and a first current measuring unit to generate and measure the maximum current the current measurement time, the holding second electric current by measuring the effective current applied to the pulse generating portion for generating an effective electric current measured value The measurement unit, and a constant voltage and constant current control to main power supply and, the first current measuring unit current measurement value and the second current measuring unit effective current measurements to do so as to be equal to the respective predetermined set value, the two ignition a central processing unit and a sustain pulse generating unit for controlling the operation and the auxiliary power supply unit for supplying power to the two ignition unit and the central processing unit may further include.