基本信息:
- 专利标题： 묘화 장치 및 물품 제조 방법
- 专利标题（英）：Drawing apparatus and method of manufacturing article
- 专利标题（中）：绘图装置和制造方法
- 申请号：KR1020110070385 申请日：2011-07-15
- 公开(公告)号：KR101443426B1 公开(公告)日：2014-09-24
- 发明人： 히라따요시히로 , 야마자끼도루
- 申请人： 캐논 가부시끼가이샤
- 申请人地址： **-*, Shimomaruko *-chome, Ohta-ku, Tokyo, Japan
- 专利权人： 캐논 가부시끼가이샤
- 当前专利权人： 캐논 가부시끼가이샤
- 当前专利权人地址： **-*, Shimomaruko *-chome, Ohta-ku, Tokyo, Japan
- 代理人： 장수길; 박충범
- 优先权： JPJP-P-2010-162218 2010-07-16
- 主分类号： H01L21/027
- IPC分类号： H01L21/027 ; G03F7/20
Drawing apparatus for drawing a pattern on a substrate with a plurality of charged particle beam includes a blanking aperture array including a plurality of apertures, comprising a plurality of blankers, and by each deflecting a plurality of charged particle beam by a plurality of blankers blanking opening by blanking unit configured to cause blocking respectively the plurality of charged particle beam deflection array, and to transmit the generating circuit configured to generate a blanking instruction in serial form, the blanking command generated by the generation circuit to the blanking unit It includes a serial transfer cable configuration, the blanking unit is configured converts the blanking instruction in serial form received through a serial transmission cable in the blanking command of the parallel type, based on a blanking instruction in parallel format so as to drive the plurality of blankers do.
公开/授权文献:
- KR1020120008469A 묘화 장치 및 물품 제조 방법 公开/授权日：2012-01-30
信息查询:
EspacenetIPC结构图谱:
| H | 电学 |
| --H01 | 基本电气元件 |
| ----H01L | 半导体器件；其他类目未包含的电固体器件 |
| ------H01L21/00 | 专门适用于制造或处理半导体或固体器件或其部件的方法或设备 |
| --------H01L21/02 | .半导体器件或其部件的制造或处理 |
| ----------H01L21/027 | ..未在H01L21/18或H01L21/34组中包含的为进一步的光刻工艺在半导体之上制作掩膜 |