基本信息:
- 专利标题： 기판 이송 장치 및 기판 처리 장치
- 专利标题（英）：Apparatus for transfering substrate and processing substrate
- 专利标题（中）：用于转移衬底和处理衬底的装置
- 申请号：KR1020120128136 申请日：2012-11-13
- 公开(公告)号：KR101403458B1 公开(公告)日：2014-06-30
- 发明人： 심형기 , 김현중 , 안진영 , 차은희
- 申请人： 삼성디스플레이 주식회사 , 에이피에스홀딩스 주식회사
- 申请人地址： 경기 용인시 기흥구 삼성로*(농서동)
- 专利权人： 삼성디스플레이 주식회사,에이피에스홀딩스 주식회사
- 当前专利权人： 삼성디스플레이 주식회사,에이피에스홀딩스 주식회사
- 当前专利权人地址： 경기 용인시 기흥구 삼성로*(농서동)
- 代理人： 남승희
- 主分类号： H01L21/677
- IPC分类号： H01L21/677 ; B65G49/07 ; H01L31/18 ; H01L51/56
The present invention relates to a substrate transfer apparatus and a substrate processing apparatus, and particularly to transferring substrates during the substrate processing substrate processing apparatus crystallizing a thin film on a substrate. Embodiment of the substrate transfer apparatus of the present invention and the feed for the sliding bearing by the air, surrounding the periphery of the air bearing, a suction air pressure for absorbing the reflected after being sprayed from the air bearing. Further embodiment of the substrate transfer apparatus of the present invention, the first axis and to put the guide rails of the pair of spaced apart direction, has a length in the second axis direction connecting between the pair of guide rails, provided in the lower face air by the bearing of the first axis feed for sliding back and forth in a first axis direction along the guide rail, the first being provided to transfer one upper one-axis, the first axis feed for by the air bearing provided on the lower surface along a second axis feed it is binary sliding back and forth in the two axial directions against, and the rotary shaft guides are inserted wherein the single central inner two-axis transfer, and a substrate support provided in the rotary shaft guides the top, surrounding the periphery of the air bearing , and includes an inhaler to absorb the air pressure which is reflected and then injected from the air bearing.
公开/授权文献:
- KR1020140061614A 기판 이송 장치 및 기판 처리 장치 公开/授权日：2014-05-22