The present invention relates to a multi-line laser annealing device, the main objective is to obtain a plurality of line laser light is evenly distributed as a whole and high optical efficiency, by locally annealing conditions to allow treatment at a time even if the other base productivity of the annealing process to improve the.
The present invention to achieve this purpose,
And the primary light source provided at least one, grating and provided with flat plate shape so as to produce a laser beam generated from the primary light source into a plurality of linear laser, the second of the grating reflector provided on the grating surface having at least one the light source and, to secure the annealing base material to be annealed by the multi-laser is irradiated from the second light source unit, and configured to be driven in the XYZ directions, a multi-line laser annealing apparatus including the possible base plate adjustment of the driving speed It relates to,
And the primary light source is a laser source made up of any one of a light emitting diode or a laser diode, and the laser beam produced by the laser source 90 by transmitting or reflecting at a right angle direction provided in the end give divide by two forked beam splitter, wherein It made a two-pronged laser light produced by the beam splitter mirror for reflecting a control to the secondary light source.
Accordingly, and to obtain a high luminous efficiency and a large number of line light that is distributed evenly as a whole, even if the other base material by locally annealing conditions to allow treatment at a time has the advantage of improving the productivity of the annealing process.