基本信息:
- 专利标题: 마이크로리소그래피 투영 노광 장치의 광학 시스템
- 专利标题(英):Optical system, in particular in a microlithographic projection exposure apparatus
- 专利标题(中):光学系统,特别是微波投影曝光装置
- 申请号:KR1020127011154 申请日:2010-09-08
- 公开(公告)号:KR101328870B1 公开(公告)日:2013-11-13
- 发明人: 호프,알브렉트 , 뉴게바우어,디에트마르 , 프레이만,롤프
- 申请人: 칼 짜이스 에스엠티 게엠베하
- 申请人地址: Rudolf-Eber-Strasse * ***** Oberkochen Germany
- 专利权人: 칼 짜이스 에스엠티 게엠베하
- 当前专利权人: 칼 짜이스 에스엠티 게엠베하
- 当前专利权人地址: Rudolf-Eber-Strasse * ***** Oberkochen Germany
- 代理人: 한양특허법인
- 优先权: DE10 2009 043 5018 2009-09-30; DE10 2009 054 8602 2009-12-17; US61/247,142 2009-09-30
- 国际申请: PCT/EP2010/063158 2010-09-08
- 国际公布: WO2011039036 2011-04-07
- 主分类号: G01M11/00
- IPC分类号: G01M11/00 ; G03F7/20 ; G01B9/02 ; G02B13/24
The present invention particularly relates to an optical system, the optical system includes a first optical component (110 210 910), the second optical component (120 220 920), and the first optical component and the relative position of said second optical component, comprises a measuring device for determining the six degrees of freedom, the measurement device 6 is different from the length measurement unit (131-136; 231-236; 931-936) of the first optical component and said second optical component via of being adapted to determine the relative position, the length measuring unit (131-136; 231-236; 931-936) extends directly between the first optical component (110 210 910) and the second optical component (120 220 920) .
公开/授权文献:
- KR1020120092613A 마이크로리소그래피 투영 노광 장치의 광학 시스템 公开/授权日:2012-08-21
信息查询:
EspacenetIPC结构图谱:
G | 物理 |
--G01 | 测量;测试 |
----G01M | 机器或结构部件的静或动平衡的测试;未列入其他类目的结构部件或设备的测试 |
------G01M11/00 | 光学设备的测试;其他类目未包括的用光学方法测试结构部件 |