基本信息:
- 专利标题： 기판의 완충층용 이트리아 용액의 제조방법
- 专利标题（英）：manufacturing method for yttria solution using buffer layer of board
- 专利标题（中）：使用板缓冲层的氧化钇溶液的制备方法
- 申请号：KR1020110133224 申请日：2011-12-12
- 公开(公告)号：KR101323252B1 公开(公告)日：2013-10-30
- 发明人： 고락길 , 하동우 , 손명환 , 김동혁 , 강부민
- 申请人： 한국전기연구원
- 申请人地址： 경상남도 창원시 성산구 불모산로**번길 ** (성주동)
- 专利权人： 한국전기연구원
- 当前专利权人： 한국전기연구원
- 当前专利权人地址： 경상남도 창원시 성산구 불모산로**번길 ** (성주동)
- 代理人： 특허법인부경
- 主分类号： C23C26/00
- IPC分类号： C23C26/00 ; C23C2/04
The first step of the invention is that the buffer layer for the substrate according to the manufacturing method of the triazole solution, a mixture of yttrium acetate tetrahydrate and the methanol formed and the mixture was stirred and; And the second step of the chelating agent added diethanolamine To a mixture of Step 1 and synthesized compounds was stirred; It was filtered using a compound synthesized in the second step of the third filter to obtain a sol; and a manufacturing method of a yttria solution for the buffer layer of the substrate that is configured to include a technology with a base. Accordingly, the sol-there is an advantage that the diffusion barrier of the buffer layer role (diffusion barrier), which was prepared in the yttria solution produced by the gel process, is applied on the upper surface of the substrate prevents the spread of and at the same time the substrate material Sikkim planarizing a substrate .
公开/授权文献:
- KR1020130066415A 기판의 완충층용 이트리아 용액의 제조방법 公开/授权日：2013-06-20