基本信息:
- 专利标题： 미립자의 제조방법 및 장치
- 专利标题（英）：Method and device for manufacturing fine particles
- 专利标题（中）：生产细颗粒的方法和装置
- 申请号：KR1020077007949 申请日：2005-09-07
- 公开(公告)号：KR101207602B1 公开(公告)日：2012-12-03
- 发明人： 유부타가즈히로 , 나카무라게이타로 , 후지이다카시
- 申请人： 가부시키가이샤 닛신 세이분 구루프 혼샤 , 닛신 엔지니어링 가부시키가이샤
- 申请人地址： *-**, KANDANISHIKI-CHO, CHIYODA-KU, TOKYO, JAPAN
- 专利权人： 가부시키가이샤 닛신 세이분 구루프 혼샤,닛신 엔지니어링 가부시키가이샤
- 当前专利权人： 가부시키가이샤 닛신 세이분 구루프 혼샤,닛신 엔지니어링 가부시키가이샤
- 当前专利权人地址： *-**, KANDANISHIKI-CHO, CHIYODA-KU, TOKYO, JAPAN
- 代理人： 강일우; 이상혁; 조휘건; 이경희; 유지원; 홍기천; 방은희
- 优先权： JPJP-P-2004-00259740 2004-09-07; JPJP-P-2005-00046086 2005-02-22; JPJP-P-2005-00063462 2005-03-08; JPJP-P-2005-00216979 2005-07-27
- 国际申请： PCT/JP2005/016434 2005-09-07
- 国际公布： WO2006028140 2006-03-16
- 主分类号： C01B13/14
- IPC分类号： C01B13/14 ; B01J2/02 ; C01G23/00 ; B01J19/08
Method for producing fine particles, introducing the particulate material into the thermal plasma for producing a salt, and a mixture of a gas phase state, and rapid cooling it to produce a fine particle. In this method, the fine particles for producing materials, preferably dispersed or dissolved in a dispersion medium or a solvent, containing the flammable material to as to optimize a dispersion liquid such as slurry a colloidal solution or dissolved solution, and solution to the dispersion liquid, or, or fine particles for preparing a material, dispersed by using a carrier gas and the combustible material is introduced into the thermal plasma flame. In the manufacturing method and apparatus of the fine particles, a sufficient supply amount of the gas in the rapid cooling to a mixture of a gas phase state, and supplied toward a thermal plasma tail salt. Further, in the method and apparatus, by introducing the primary particles in the cyclone and subjected to cooling and classifying and recovering the coarse particles is not more than the second particle has been removed, the particle diameter of 100nm. Thermal plasma, particles, method of manufacture, the manufacturing apparatus
公开/授权文献:
- KR1020070099536A 미립자의 제조방법 및 장치 公开/授权日：2007-10-09
信息查询:
EspacenetIPC结构图谱:
| C | 化学；冶金 |
| --C01 | 无机化学 |
| ----C01B | 非金属元素；其化合物 |
| ------C01B13/00 | 氧；臭氧；一般氧化物或氢氧化物 |
| --------C01B13/14 | .制备一般氧化物或氢氧化物的方法 |