The present invention increases the utilization efficiency of the EL materials, and, to the uniformity or throughput of forming an EL layer film provides a vapor deposition apparatus and a deposition method excellent in the film formation apparatus. In addition, the present invention, with respect to the large area substrate, to provide a method for efficiently depositing an EL material. In addition, the present invention provides a system capable of avoiding the impurity mixed into the EL material. Deposition device according to the present invention is further characterized in that the substrate and the evaporation source are moved relatively. That is, the present invention is in the deposition, the substrate is an evaporation source holder install the deposited material is sealed in the container, for moving to a certain pitch, or the evaporation source to the substrate and characterized in that movement in a specific pitch. In addition, the present invention is sealed, and a deposition material in the refining vessel, and then conveyed, by installing the vessel directly to the film formation apparatus of the deposition apparatus, it characterized in that a vapor deposition.
The light emitting device, a deposition device, EL layer, the evaporation source holder, the vessel, electronic devices