基本信息:
- 专利标题: 酸発生剤、スルホン酸、スルホニルハライド化合物および感放射線性樹脂組成物
- 专利标题(英):Acid generator, sulfonic acid, sulfonyl halide compound and a radiation-sensitive resin composition
- 申请号:JP2005503005 申请日:2004-02-20
- 公开(公告)号:JPWO2004078703A1 公开(公告)日:2006-06-08
- 发明人: 江幡 敏 , 敏 江幡 , 勇 王 , 勇 王 , 西村 功 , 功 西村
- 申请人: Jsr株式会社 , Jsr株式会社
- 专利权人: Jsr株式会社,Jsr株式会社
- 当前专利权人: Jsr株式会社,Jsr株式会社
- 优先权: JP2003059028 2003-03-05
- 主分类号: C07C317/06
- IPC分类号: C07C317/06 ; C07C309/17 ; C07C309/19 ; C07C309/23 ; C07C381/12 ; C07D207/46 ; G03F7/004 ; G03F7/038 ; G03F7/039 ; G03F7/075 ; H01L21/027
No problem flammability and human stimulable, high acidity and the boiling point of the acid generated, the acid diffusion length in the resist film in reasonably short, small dependence on density of the mask pattern, smoothness the novel acid generators capable of forming an excellent resist pattern, acid generated from the acid generator, useful sulfonyl halide compound as raw material for synthesizing the acid generator, as well as sensitive containing acid generator to provide a radiation sensitive resin composition.
Acid generator having a structure represented by the following general formula (I).
[However, R
1 is an alkoxycarbonyl group, an alkylsulfonyl group, a monovalent substituent such as alkoxy sulfonyl group, R
2 to R
4 represents a hydrogen atom or an alkyl group, k is an integer of 0 or more, n represents is an integer of 0 to 5. ]
The radiation-sensitive resin composition, in addition to the acid generator, containing an acid-dissociable group-containing resin is a positive type, the negative containing an alkali-soluble resin and a crosslinking agent.
公开/授权文献:
信息查询:
EspacenetIPC结构图谱:
C | 化学;冶金 |
--C07 | 有机化学 |
----C07C | 无环或碳环化合物 |
------C07C317/00 | 砜;亚砜 |
--------C07C317/02 | .有砜基或亚砜基连接在非环碳原子上 |
----------C07C317/06 | ..含环饱和碳架的 |