基本信息:
- 专利标题： Maximum temperature thermometer of thin film
- 专利标题（中）：薄膜最大温度温度计
- 申请号：JP6558583 申请日：1983-04-15
- 公开(公告)号：JPS59192928A 公开(公告)日：1984-11-01
- 发明人： MIYAGAWA SUSUMU
- 申请人： Hitachi Ltd
- 专利权人： Hitachi Ltd
- 当前专利权人： Hitachi Ltd
- 优先权： JP6558583 1983-04-15
- 主分类号： H01C7/00
- IPC分类号： H01C7/00 ; G01K3/00 ; G01K7/18 ; H01C7/02 ; H01C7/04 ; H01C17/12
摘要：
PURPOSE:To measure a max. temp. without contaminating a vacuum atmosphere by forming an Si-Cr-O ternary alloy film having a prescribed constituent on a substrate and providing electrodes on the alloy film. CONSTITUTION:On the substrate obtained by forming thinly a glass on a ceramic and making the surface flat, the Si-Cr-O alloy film 2 having the composition of 42.8-48.8at% Si, 26.0-32.0at% Cr and the balance O is formed to the thickness of about 1,500Angstrom by sputtering method. As an electrode 3, Ni.Cr/Au is formed by about 1,000Angstrom thickness of Ni.Cr by sputtering or vacuum deposition method, and scribed to about 5omegaX15mm. by laser. Thereafter, the heat treatment is performed by the heating upto 200 deg.C and the cooling.
摘要（中）：
目的：测量最大 温度。 通过在基板上形成具有规定成分的Si-Cr-O三元合金膜并在合金膜上设置电极而不污染真空气氛。 构成：在通过在陶瓷上形成薄片玻璃并使表面平坦而获得的基板上，Si-Cr-O合金膜2的组成为42.8-48.8at％的Si，26.0-32.0at％的Cr，余量为O 通过溅射法形成约1500Ang的厚度。 作为电极3，Ni.Cr/Au由溅射或真空沉积法形成约1000埃厚度的Ni.Cr，并刻成约5m×150mm。 通过激光。 此后，通过加热至200℃和冷却进行热处理。
公开/授权文献:
- JPS6223382Y2 公开/授权日：1987-06-15