基本信息:
- 专利标题: OBSERVING DEVICE FOR FOREIGN OBJECT
- 申请号:JP2779792 申请日:1992-02-14
- 公开(公告)号:JPH05223747A 公开(公告)日:1993-08-31
- 发明人: SATO OSAMU
- 申请人: HITACHI LTD
- 专利权人: HITACHI LTD
- 当前专利权人: HITACHI LTD
- 优先权: JP2779792 1992-02-14
- 主分类号: G01B11/30
- IPC分类号: G01B11/30 ; G01N21/84 ; G01N21/88 ; G01N21/93 ; G01N21/94 ; G01N21/956 ; H01J37/22 ; H01L21/66
摘要:
PURPOSE:To enable even a minute foreign object to be retrieved easily and in a short time by means of a scanning electron microscope by judging the level of a size of the foreign object which is provided, dividing an observation region when the level of the foreign object is equal to or less than a certain value, and retrieving each divided region successively. CONSTITUTION:A wafer 1 which was measured is carried to an optical surface foreign object inspection device 2. A foreign object information 3 is controlled by a CPU 4 within the device 2. To enlarge and observe a minute foreign object, the wafer 1 is carried to a scan-type electronic microscope 5 for observation. For example, a screen 11 of the microscope 5 is divided into 25 parts (5X5 divisions) for observing each division, thus enabling magnification for observation to be improved by five times as large as a reference magnification. Then, foreign objects 12 within 1mm on an observation CRT can be observed as those within 5 mm , thus enabling the foreign objects to be found easily. A movement for retrieval in the division region can be made speedily and accurately by using an electron beam.
公开/授权文献:
- JP3186171B2 公开/授权日:2001-07-11
信息查询:
EspacenetIPC结构图谱:
G | 物理 |
--G01 | 测量;测试 |
----G01B | 长度、厚度或类似线性尺寸的计量;角度的计量;面积的计量;不规则的表面或轮廓的计量 |
------G01B11/00 | 以采用光学方法为特征的计量设备 |
--------G01B11/30 | .用于计量表面的粗糙度和不规则性 |