基本信息:
- 专利标题： 発光装置及び描画装置
- 专利标题（英）：LIGHT-EMITTING DEVICE AND DRAWING DEVICE
- 申请号：JP2020054936 申请日：2020-03-25
- 公开(公告)号：JP2021154537A 公开(公告)日：2021-10-07
- 发明人： 粕谷 洋介 , 大塚 勤
- 申请人： 富士フイルムビジネスイノベーション株式会社
- 申请人地址： 東京都港区赤坂九丁目7番3号
- 专利权人： 富士フイルムビジネスイノベーション株式会社
- 当前专利权人： 富士フイルムビジネスイノベーション株式会社
- 当前专利权人地址： 東京都港区赤坂九丁目7番3号
- 代理人： 特許業務法人太陽国際特許事務所
- 主分类号： H04N1/036
- IPC分类号： H04N1/036 ; B41J2/447
To provide a light-emitting device that reduces a dimension of the light-emitting device in a width direction as compared to that when a flow channel is provided on an outside in a width direction of a substrate, and to provide a drawing device.SOLUTION: An exposure device 40 includes: a substrate 42 extending in one direction; multiple light-emitting parts 44 which are arranged on a side of a surface 42A of the substrate 42 while being deviated in one direction and in which multiple light sources 64 are supported along one direction to a support body 60 extending in one direction; and a flow channel 122 arranged on the side of a surface 42A of the substrate 42 so as to surround at least part of the light-emitting parts 44 and supplying air along one direction.SELECTED DRAWING: Figure 4