基本信息:
- 专利标题: 画像内のホールパターンの探索方法、パターン検査方法、及びパターン検査装置
- 专利标题(英):HOLE PATTERN SEARCH METHOD IN IMAGE, PATTERN INSPECTION METHOD, AND PATTERN INSPECTION DEVICE
- 申请号:JP2020041385 申请日:2020-03-10
- 公开(公告)号:JP2021144360A 公开(公告)日:2021-09-24
- 发明人: 杉原 真児
- 申请人: 株式会社ニューフレアテクノロジー
- 申请人地址: 神奈川県横浜市磯子区新杉田町8番1
- 专利权人: 株式会社ニューフレアテクノロジー
- 当前专利权人: 株式会社ニューフレアテクノロジー
- 当前专利权人地址: 神奈川県横浜市磯子区新杉田町8番1
- 代理人: 池上 徹真; 須藤 章; 高下 雅弘
- 主分类号: G01N23/2251
- IPC分类号: G01N23/2251 ; G06T7/00 ; H01L21/66 ; G06T7/60
To provide a hole pattern search method in an image and an inspection device capable of detecting a hole with high accuracy while shortening processing time.SOLUTION: A hole pattern search method in an image comprises the steps of: extracting a plurality of contour line position candidates that are a plurality of contour position candidates through which a contour line of a hole pattern passes from an image in which the hole pattern is formed; creating a distance map that defines, for each pixel in an area containing the plurality of contour position candidates, for each direction in a plurality of directions, a distance from each contour line position candidate of the plurality of contour line position candidates to each pixel lined up in a target direction; extracting, using each distance map created for each direction, a central pixel candidate of the hole pattern; and searching for and outputting a group of contour line position candidates satisfying a predetermined condition from the plurality of contour line position candidates as a plurality of contour line positions through which the contour line of the hole pattern passes, starting from a center pixel candidate.SELECTED DRAWING: Figure 5
信息查询:
EspacenetIPC结构图谱:
G | 物理 |
--G01 | 测量;测试 |
----G01N | 借助于测定材料的化学或物理性质来测试或分析材料 |
------G01N23/00 | 利用未包括在G01N21/00或G01N22/00组内的波或粒子辐射来测试或分析材料,例如X射线、中子 |
--------G01N23/02 | .通过使辐射透过材料 |
----------G01N23/225 | ..利用电子或离子微探针 |
------------G01N23/2251 | ...使用入射电子束,例如扫描电子显微镜 |