基本信息:
- 专利标题: 高純度シリカの製造方法
- 专利标题(英):HIGH-PURITY SILICA PRODUCTION METHOD
- 申请号:JP2019229815 申请日:2019-12-19
- 公开(公告)号:JP2021098613A 公开(公告)日:2021-07-01
- 发明人: 清水 博之 , 清水 政義 , 清水 義文 , ビニョブ ラビ
- 申请人: SEAVAC株式会社
- 申请人地址: 兵庫県尼崎市杭瀬南新町1−12−6
- 专利权人: SEAVAC株式会社
- 当前专利权人: SEAVAC株式会社
- 当前专利权人地址: 兵庫県尼崎市杭瀬南新町1−12−6
- 代理人: 藤巻 正憲
- 主分类号: C01B33/18
- IPC分类号: C01B33/18
To provide a high-purity silica production method which can produce high-purity silica well suited for production of high-purity silicon for a solar cell with high efficiency and at low cost.SOLUTION: Extraction from diatomaceous earth with an acid is performed, in which impurities of an alkaline earth metal, an alkali metal, a transition metal and a post-transition metal are removed through a filter with washing with pure water, to thereby give silica with which sodium hydroxide is then reacted to give an aqueous alkali silicate solution (water glass). The water glass is passed through an ion exchange chelate resin and an anion exchange chelate resin to remove, as impurities, boron which is a metalloid and phosphorus which is a nonmetal. Once a desired purity of the silica is attained, an aqueous water glass solution is titrated with an acid to give a silica gel. The silica gel is dried at about 1,200°C or higher and the resultant is centrifugally separated and filtered to collect the silica in powder form and with high-purity. The silica is then used in production of high-purity silicon.SELECTED DRAWING: Figure 1
信息查询:
EspacenetIPC结构图谱:
C | 化学;冶金 |
--C01 | 无机化学 |
----C01B | 非金属元素;其化合物 |
------C01B33/00 | 硅;其化合物 |
--------C01B33/08 | .含卤素的化合物 |
----------C01B33/12 | ..硅石;其水合物,如勒皮硅酸 |
------------C01B33/18 | ...既非溶胶态又非凝胶态的细分散硅石的制备;其后处理 |