基本信息:
- 专利标题： 感光性組成物、及びメッキ造形物の製造方法
- 专利标题（英）：Photosensitive composition, and a method for manufacturing a plated shaped object
- 专利标题（中）：光敏组合物，并制备一种镀敷成形制品的方法
- 申请号：JP2016070951 申请日：2016-03-31
- 公开(公告)号：JP2017003966A 公开(公告)日：2017-01-05
- 发明人： 桂山 真 , 秋丸 尚徳 , 廣 昭人
- 申请人： JSR株式会社
- 申请人地址： 東京都港区東新橋一丁目9番2号
- 专利权人： JSR株式会社
- 当前专利权人： JSR株式会社
- 当前专利权人地址： 東京都港区東新橋一丁目9番2号
- 代理人： 特許業務法人SSINPAT
- 优先权： JP2015119149 2015-06-12
- 主分类号： G03F7/40
- IPC分类号： G03F7/40 ; H01L21/60 ; G03F7/031
With a compound (B), photo-radical polymerization initiator represented by the following formula (1) (C), as well as keto oxime ester structure having at least one ethylenically unsaturated double bond in A per molecule photoradical polymerization initiator (D1), and a photosensitive composition containing at least one photoradical polymerization initiator (D) selected from a photo-radical polymerization initiator (D2) having a biimidazole structure. In the formula (1), at least one of R
1a to R
1 e is a group containing a (meth) acryloyl group. R
3 represents an aryl group having a group containing at least one (meth) acryloyl groups on the aromatic ring.
[Effect] In a thick film, it is possible to form a resist having a rectangular longitudinal section, it is possible to produce a plated shaped article having a suitable shape.
.BACKGROUND