基本信息:
- 专利标题: 半導体装置
- 专利标题(英):Semiconductor device
- 专利标题(中):半导体设备
- 申请号:JP2016135690 申请日:2016-07-08
- 公开(公告)号:JP2016213483A 公开(公告)日:2016-12-15
- 发明人: 杉澤 希 , 波多野 薫 , 瀬尾 哲史
- 申请人: 株式会社半導体エネルギー研究所
- 申请人地址: 神奈川県厚木市長谷398番地
- 专利权人: 株式会社半導体エネルギー研究所
- 当前专利权人: 株式会社半導体エネルギー研究所
- 当前专利权人地址: 神奈川県厚木市長谷398番地
- 优先权: JP2010203028 2010-09-10
- 主分类号: H01L51/50
- IPC分类号: H01L51/50 ; H01L29/786
An object of the present invention is to provide an excellent semiconductor device or a light-emitting device of the reliability using an oxide semiconductor.
It includes an A oxide first electrode 401 connected to the source or drain electrode layer of the transistor 410 including a semiconductor, a light emitting substance between the second electrode 402 overlapping with the first electrode in the semiconductor device having an organic layer 403, the second electrode, eliminating the active conducting material that emits hydrogen ion or hydrogen molecules by reducing impurities (e.g. water) containing a hydrogen atom. In particular, it reacts with water using an inert conductive materials hardly generate hydrogen ions or hydrogen molecule, in a semiconductor device including an oxide semiconductor. Specifically, the metal oxide reduction potential larger than that of the standard hydrogen electrode, oxidation-reduction potential is large conductive metal oxide than the alloy to oxidation-reduction potential of greater metal together in comparison with a standard hydrogen electrode within the standard hydrogen electrode use things.
.FIELD 1
公开/授权文献:
- JP6240268B2 半導体装置の作製方法 公开/授权日:2017-11-29