发明专利
JP2014500523A Laser direct writing system to the mesa structure having a side wall of the reverse slope
审中-公开
基本信息:
- 专利标题： Laser direct writing system to the mesa structure having a side wall of the reverse slope
- 专利标题（中）：空值
- 申请号：JP2013535359 申请日：2011-10-18
- 公开(公告)号：JP2014500523A 公开(公告)日：2014-01-09
- 发明人： デラ、オリビエ , フュジエ、パスカル , テビー、ゾエ
- 申请人： コミシリア ア レネルジ アトミック エ オ エナジーズ オルタネティヴズ
- 专利权人： コミシリア ア レネルジ アトミック エ オ エナジーズ オルタネティヴズ
- 当前专利权人： コミシリア ア レネルジ アトミック エ オ エナジーズ オルタネティヴズ
- 优先权： FR1058832 2010-10-27
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; H01L21/027
General field of the invention, using known techniques as "Rifutoon" on a flat substrate comprising one or more flat photosensitive layer (1), photo designed to fabricate electronic components on the lithography system. System according to the invention, uses a laser direct writing technique. It to create the outline having a reverse inclination in the layer, configured as useful portions of the optical beam (F) is inclined on the plane of the photosensitive layer, an optical or mechanical means, optical useful portions of the beam effectively contribute to create the external shape is a portion of the optical beam. In one preferred embodiment of the present invention, the system comprises a means for partial closure of the optical beam is located in the vicinity of the focusing optical section (23) (50).