发明专利
JP2014133912A Plasma device, and method for manufacturing carbon thin film using the same
审中-公开
基本信息:
- 专利标题: Plasma device, and method for manufacturing carbon thin film using the same
- 专利标题(中):等离子体装置以及使用其制造碳薄膜的方法
- 申请号:JP2013001872 申请日:2013-01-09
- 公开(公告)号:JP2014133912A 公开(公告)日:2014-07-24
- 发明人: KATO KENJI , SON WANG-QI , MIKAMI TAKASHI
- 申请人: Nissin Electric Co Ltd , 日新電機株式会社
- 专利权人: Nissin Electric Co Ltd,日新電機株式会社
- 当前专利权人: Nissin Electric Co Ltd,日新電機株式会社
- 优先权: JP2013001872 2013-01-09
- 主分类号: C23C14/24
- IPC分类号: C23C14/24 ; C23C14/06 ; H05H1/48
摘要:
PROBLEM TO BE SOLVED: To provide a plasma device using arc discharge capable of continuing spark-less discharge.SOLUTION: A plasma device 10 comprises a vacuum container 1, a cathode flange 5, a magnet 7, a negative electrode member 8, a trigger electrode 11, and a power source 14. The cathode flange 5 is fixed to a side wall of the vacuum container 1 opposite to a substrate 20. The negative electrode member 8 is made of laminate carbon or glassy carbon, and is mounted to the cathode flange 5. The power source 14 applies negative voltage to the cathode flange 5. The magnet 7 applies an axial magnetic field having a magnetic field component in a normal direction of the negative electrode member 8 larger than a magnetic field component in an in-plane direction of the negative electrode member 8 to the negative electrode member 8. While an axial magnetic field is applied to the negative electrode member 8 by the magnet 7, the trigger electrode 11 is brought into contact with the negative electrode member 8 and arc discharge is started, so as to form a carbon thin film on the substrate 20.
摘要(中):
要解决的问题:提供使用能够持续无火花放电的电弧放电的等离子体装置。解决方案:等离子体装置10包括真空容器1,阴极凸缘5,磁体7,负极部件8,触发器 电极11和电源14.阴极凸缘5固定在真空容器1的与基板20相对的侧壁上。负电极部件8由碳或碳质碳组成,并被安装到阴极 电源14向阴极凸缘5施加负电压。磁体7施加在负极部件8的法线方向上的磁场分量大于面内的磁场成分的轴向磁场 负极部件8的方向连接到负极部件8.在通过磁体7对负极部件8施加轴向磁场的情况下,使触发电极11与负极部件8接触。 电极部件8开始电弧放电,从而在基板20上形成碳薄膜。
公开/授权文献:
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