PROBLEM TO BE SOLVED: To provide a cleaning device, along with a cleaning method, for a component of a vapor deposition device incorporating a susceptor that holds, for free rotation, a plurality of substrate holders by way of a rotary mechanism with bearing, capable of efficiently removing deposits or sticking substance that sticks to a vapor deposition device component such as a substrate holder and a susceptor after vapor deposition.SOLUTION: The cleaning device includes a housing part for a susceptor and a substrate holder, means for rotating a susceptor and/or means for rotating a substrate holder, a heater, a cleaning gas introduction part, and a cleaning gas exhausting part. The susceptor which holds the substrate holder having been used for vapor deposition is stored in the cleaning device, and the susceptor and/or the substrate holder is rotated and cleaning gas is introduced to remove deposits or sticking substance that sticks to at the time of vapor deposition.