基本信息:
- 专利标题： Stability of the substrate using a vacuum preload air bearing chuck
- 申请号：JP2009554719 申请日：2008-03-19
- 公开(公告)号：JP2010522431A 公开(公告)日：2010-07-01
- 发明人： ウォルターズ・クリスチャン・エイチ． , ダンドー・ハワード・ダブリュ． , チャオ・グオヘン , ドイル・ポール・アンドリュー , バエズ−イラバニ・メヘディ , ベルヤエブ・アレクサンダー
- 申请人： ケーエルエー−テンカー・コーポレーションKla−Tencor Corporation
- 专利权人： ケーエルエー−テンカー・コーポレーションKla−Tencor Corporation
- 当前专利权人： ケーエルエー−テンカー・コーポレーションＫｌａ−Ｔｅｎｃｏｒ Ｃｏｒｐｏｒａｔｉｏｎ
- 优先权： US68872007 2007-03-20
- 主分类号： H01L21/683
- IPC分类号： H01L21/683 ; F16C32/06 ; H01L21/66
【選択図】図１
A substrate processing method and apparatus is disclosed. The device is configured to provide a gas flow to a surface, comprising a chuck having a surface with one or more gas flow openings. The surface includes one or more vacuum channels distributed across the surface. Vacuum channel makes it possible to draw a vacuum therethrough. In this method, the substrate is maintained in the vicinity of the chuck surface at the back surface of the substrate, because it is supported sufficiently close to the chuck surface, in relation to the gas flow and vacuum spaced a back surface and the chuck surface of the substrate can do. Gas flow is provided through the gas flow openings, the vacuum is pulled through one or more vacuum channels. The substrate is moved along the direction substantially perpendicular to the substrate surface.
.FIELD 1