基本信息:
- 专利标题： Photoacid generator and photosensitive resin composition
- 专利标题（中）：光敏发生器和感光树脂组合物
- 申请号：JP2004346723 申请日：2004-11-30
- 公开(公告)号：JP2006151897A 公开(公告)日：2006-06-15
- 发明人： MIKI SADAO
- 申请人： Eiweiss Kk , アイバイツ株式会社
- 专利权人： Eiweiss Kk,アイバイツ株式会社
- 当前专利权人： Eiweiss Kk,アイバイツ株式会社
- 优先权： JP2004346723 2004-11-30
- 主分类号： C07C309/65
- IPC分类号： C07C309/65 ; G03F7/004 ; H01L21/027
摘要：
PROBLEM TO BE SOLVED: To provide a new photoacid generator generating sulfonic acid by photo irradiation and a photosensitive resin composition comprising the photoacid generator.
SOLUTION: The photoacid generator is a compound expressed by formula (I). In the formula R is an alkyl group, a fluorinated alkyl group, Xs may be the same as or different from each other and are each a hydrogen atom, an alkyl, an alkoxy, an alkoxycarbonyl, an acyl, an alkylthio, an arylthio, a polymethylene group formed by intermolecular or intramolecular bonding between Xs, a carboxy group, a hydroxy group, a halogen atom or a cyano group, wherein at least one of the Xs bonding to a carbon atom on the β-position to a -OSO
2 R group, is a hydrogen atom. p, q and r are each an integer and each independently representing length of carbon chain bonding two carbons on bridgehead position, and p is 1-3, q is 0-3 and r is 1-2.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要（中）：
SOLUTION: The photoacid generator is a compound expressed by formula (I). In the formula R is an alkyl group, a fluorinated alkyl group, Xs may be the same as or different from each other and are each a hydrogen atom, an alkyl, an alkoxy, an alkoxycarbonyl, an acyl, an alkylthio, an arylthio, a polymethylene group formed by intermolecular or intramolecular bonding between Xs, a carboxy group, a hydroxy group, a halogen atom or a cyano group, wherein at least one of the Xs bonding to a carbon atom on the β-position to a -OSO
2 R group, is a hydrogen atom. p, q and r are each an integer and each independently representing length of carbon chain bonding two carbons on bridgehead position, and p is 1-3, q is 0-3 and r is 1-2.
COPYRIGHT: (C)2006,JPO&NCIPI
要解决的问题：提供通过光照射产生磺酸的新的光酸产生剂和包含光致酸产生剂的感光性树脂组合物。 光解酸产生剂是由式（I）表示的化合物。 式中，R为烷基，氟化烷基，X可以相同或不同，分别为氢原子，烷基，烷氧基，烷氧基羰基，酰基，烷硫基，芳硫基， 通过Xs，羧基，羟基，卤素原子或氰基之间的分子间或分子内键合形成的多亚甲基，其中至少一个与β位上的碳原子键合成-OSO SB> 2 R基团是氢原子。 p，q和r各自为整数，并且各自独立地表示在桥头位置上碳链键合两个碳的长度，p为1-3，q为0-3且r为1-2。 版权所有（C）2006，JPO＆NCIPI
公开/授权文献:
- JP4519621B2 Photoacid generator and a photosensitive resin composition 公开/授权日：2010-08-04
信息查询:
EspacenetIPC结构图谱:
| C | 化学；冶金 |
| --C07 | 有机化学 |
| ----C07C | 无环或碳环化合物 |
| ------C07C309/00 | 磺酸；其卤化物、酯或酐 |
| --------C07C309/01 | .磺酸 |
| ----------C07C309/64 | ..酯化磺基的硫原子连接非环碳原子 |
| ------------C07C309/65 | ...饱和碳架的 |